Strained Si, SiGe, and Ge channels for high-mobility metal-oxide-semiconductor field-effect transistors

ML Lee, EA Fitzgerald, MT Bulsara, MT Currie… - Journal of applied …, 2005 - pubs.aip.org
This article reviews the history and current progress in high-mobility strained Si, SiGe, and
Ge channel metal-oxide-semiconductor field-effect transistors (MOSFETs). We start by …

Structural properties of self-organized semiconductor nanostructures

J Stangl, V Holý, G Bauer - Reviews of modern physics, 2004 - APS
Instabilities in semiconductor heterostructure growth can be exploited for the self-organized
formation of nanostructures, allowing for carrier confinement in all three spatial dimensions …

[CARTE][B] Physics of crystal growth

A Pimpinelli, J Villain - 1999 - ui.adsabs.harvard.edu
This text discusses the physical principles of how and why crystals grow. It introduces the
fundamental properties of crystal surfaces at equilibrium, and describes simple models and …

[CARTE][B] Strain effect in semiconductors: theory and device applications

Y Sun, SE Thompson, T Nishida - 2009 - books.google.com
Strain Effect in Semiconductors: Theory and Device Applications presents the fundamentals
and applications of strain in semiconductors and semiconductor devices that is relevant for …

Elastic effects on surface physics

P Müller, A Saúl - Surface Science Reports, 2004 - Elsevier
The importance of stress and strain effects on surface physics are reviewed. For this purpose
the following points are developed.(1) The elastic, thermodynamics and atomistic definitions …

Growth and self-organization of SiGe nanostructures

JN Aqua, I Berbezier, L Favre, T Frisch, A Ronda - Physics Reports, 2013 - Elsevier
Many recent advances in microelectronics would not have been possible without the
development of strain induced nanodevices and bandgap engineering, in particular …

Surface roughening of heteroepitaxial thin films

H Gao, WD Nix - Annual Review of Materials Science, 1999 - annualreviews.org
▪ Abstract Heteroepitaxial structures with strained semiconductor thin films are widely used
in electronic and optoelectronic devices. One of the more important defect creation …

Possibility of increased mobility in Ge-Sn alloy system

JD Sau, ML Cohen - Physical Review B—Condensed Matter and Materials …, 2007 - APS
We study the effect of strain and alloying with Sn on the band structure of Ge using a
combination of ab initio and empirical pseudopotential techniques. The properties …

Step-bunching instability of vicinal surfaces under stress

J Tersoff, YH Phang, Z Zhang, MG Lagally - Physical review letters, 1995 - APS
On a vicinal surface under stress, elastic relaxation at steps produces a long-range attractive
interaction between the steps. As a result, the surface is unstable against step bunching …

[CARTE][B] Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits and Applications of SiGe and Si Strained-Layer Epitaxy

JD Cressler, S Monfray, G Freeman, D Friedman… - 2018 - taylorfrancis.com
An extraordinary combination of material science, manufacturing processes, and innovative
thinking spurred the development of SiGe heterojunction devices that offer a wide array of …