A Review on Dielectric Breakdown in Thin Dielectrics: Silicon Dioxide, High‐k, and Layered Dielectrics

F Palumbo, C Wen, S Lombardo… - Advanced Functional …, 2020‏ - Wiley Online Library
Thin dielectric films are essential components of most micro‐and nanoelectronic devices,
and they have played a key role in the huge development that the semiconductor industry …

Solution-processed memristors: performance and reliability

S Pazos, X Xu, T Guo, K Zhu, HN Alshareef… - Nature Reviews …, 2024‏ - nature.com
Memristive devices are gaining importance in the semiconductor industry for applications in
information storage, artificial intelligence cryptography and telecommunication. Memristive …

On the thermal models for resistive random access memory circuit simulation

JB Roldán, G González-Cordero, R Picos, E Miranda… - Nanomaterials, 2021‏ - mdpi.com
Resistive Random Access Memories (RRAMs) are based on resistive switching (RS)
operation and exhibit a set of technological features that make them ideal candidates for …

High‐Temporal‐Resolution Characterization Reveals Outstanding Random Telegraph Noise and the Origin of Dielectric Breakdown in h‐BN Memristors

S Pazos, T Becker, MA Villena, W Zheng… - Advanced Functional …, 2024‏ - Wiley Online Library
Memristor‐based electronic memory have recently started commercialization, although its
market size is small (~ 0.5%). Multiple studies claim their potential for hardware …

Low-voltage-operation of flexible organic C8-BTBT thin-film transistors with a reactively sputtered AlOx gate dielectric

W Liu, G Zhang, C **, Y Xu, Y Nie, X Shi, J Sun… - Applied Physics …, 2022‏ - pubs.aip.org
High-k dielectrics are frequently used for organic thin-film transistors (OTFTs), which
facilitate the reduction of the device's operating voltage and enhance the total electrical …

Dielectric breakdown in chemical vapor deposited hexagonal boron nitride

L Jiang, Y Shi, F Hui, K Tang, Q Wu, C Pan… - … applied materials & …, 2017‏ - ACS Publications
Insulating films are essential in multiple electronic devices because they can provide
essential functionalities, such as capacitance effects and electrical fields. Two-dimensional …

Study on the connection between the set transient in RRAMs and the progressive breakdown of thin oxides

FL Aguirre, A Rodriguez-Fernandez… - … on Electron Devices, 2019‏ - ieeexplore.ieee.org
In this paper, the transition rate (TR) from the high-resistance state to the low-resistance
state of a HfO2-based resistive random access memory (RRAM) is investigated. The TR is …

Impact of bilayered oxide stacks on the breakdown transients of metal–oxide–semiconductor devices: An experimental study

SM Pazos, S Boyeras Baldomá, FL Aguirre… - Journal of Applied …, 2020‏ - pubs.aip.org
The role of the bilayered structure of the gate oxide on the dynamics of progressive
breakdown is systematically studied on Au/Cr/HfO 2/Al 2 O 3/InGaAs metal–oxide …

Wear-out and breakdown of Ta2O5/Nb: SrTiO3 stacks

SB Baldomá, SM Pazos, FL Aguirre, G Ankonina… - Solid-State …, 2022‏ - Elsevier
Abstract Tantalum oxide (Ta 2 O 5) is widely used in electronics, with important applications
in backend capacitors and memristors. However, major technological challenges have to be …

A new method for estimating the conductive filament temperature in OxRAM devices based on escape rate theory

A Rodriguez-Fernandez, J Muñoz-Gorriz, J Suñé… - Microelectronics …, 2018‏ - Elsevier
Because of the atomic nature of the system under study, an estimation of the temperature of
the conductive filament (CF) in OxRAM devices as a function of the applied bias can only be …