Recent advances in GaN‐based power HEMT devices

J He, WC Cheng, Q Wang, K Cheng… - Advanced electronic …, 2021 - Wiley Online Library
The ever‐increasing power density and operation frequency in electrical power conversion
systems require the development of power devices that can outperform conventional Si …

Insulated gate and surface passivation structures for GaN-based power transistors

Z Yatabe, JT Asubar, T Hashizume - Journal of Physics D …, 2016 - iopscience.iop.org
Recent years have witnessed GaN-based devices delivering their promise of
unprecedented power and frequency levels and demonstrating their capability as an able …

High-Voltage and High- Vertical GaN-on-GaN Schottky Barrier Diode With Nitridation-Based Termination

S Han, S Yang, K Sheng - IEEE Electron Device Letters, 2018 - ieeexplore.ieee.org
We report a high-performance vertical GaN-on-GaN Schottky barrier diode (SBD) with a
planar nitridation-based termination (NT) technique. The developed NT-SBD with nearly …

Insight into the suppression mechanism of bulk traps in Al2O3 gate dielectric and its effect on threshold voltage instability in Al2O3/AlGaN/GaN metal-oxide …

K Deng, S Huang, X Wang, Q Jiang, H Yin, J Fan… - Applied Surface …, 2023 - Elsevier
Bulk trap** and its effects on threshold voltage hysteresis (ΔV TH) in Al 2 O 3/AlGaN/GaN
metal–oxide-semiconductor high electron mobility transistors (MOS-HEMTs) have been …

Effective Suppression of Amorphous Ga2O and Related Deep Levels on the GaN Surface by High-Temperature Remote Plasma Pretreatments in GaN-Based Metal …

K Deng, X Wang, S Huang, P Li, Q Jiang… - … Applied Materials & …, 2023 - ACS Publications
Gallium nitride (GaN) has been considered one of the most promising materials for the next-
generation power and radio-frequency electronic devices, as they can operate at higher …

Suppression of interface states between nitride-based gate dielectrics and ultrathin-barrier AlGaN/GaN heterostructure with in situ remote plasma pretreatments

F Guo, S Huang, X Wang, T Luan, W Shi… - Applied Physics …, 2021 - pubs.aip.org
A silicon nitride (SiN x) film deposited at 500 C by plasma-enhanced atomic layer deposition
(PEALD) is employed as the gate dielectric for GaN-based metal-insulator-semiconductor …

Progress of GaN-based E-mode HEMTs

H Huang, Y Lei, N Sun - Journal of Physics D: Applied Physics, 2024 - iopscience.iop.org
With the continuous improvement of the power density and operating frequency in power
conversion systems, it is necessary to develop the new power electronic products with better …

Status of aluminum oxide gate dielectric technology for insulated-gate GaN-based devices

A Calzolaro, T Mikolajick, A Wachowiak - Materials, 2022 - mdpi.com
Insulated-gate GaN-based transistors can fulfill the emerging demands for the future
generation of highly efficient electronics for high-frequency, high-power and high …

Improving gate reliability of 6-in E-mode GaN-based MIS-HEMTs by employing mixed oxygen and fluorine plasma treatment

N Sun, H Huang, Z Sun, R Wang, S Li… - … on Electron Devices, 2021 - ieeexplore.ieee.org
Robust and reliable gate scheme is crucial in develo** the enhancement-mode (E-mode)
AlGaN/GaN metal–insulator–semiconductor (MIS)-high electron mobility transistors …

Direct comparison of GaN-based e-mode architectures (recessed MISHEMT and p-GaN HEMTs) processed on 200mm GaN-on-Si with Au-free technology

D Marcon, M Van Hove, B De Jaeger… - … and Devices X, 2015 - spiedigitallibrary.org
Gallium nitride transistors are going to dominate the power semiconductor market in the
coming years. The natural form of GaN-based devices is “normally-on” or depletion mode (d …