[書籍][B] Measurement of Amplitude and Phase Pupil Variation for EUV Lithography Systems
ZA Levinson - 2018 - search.proquest.com
Aberration control and characterization in a state of the art photolithographic lens have the
tightest tolerances of any optical system. This is especially true in next generation extreme …
tightest tolerances of any optical system. This is especially true in next generation extreme …
Image-based pupil plane characterization via a space-domain basis
Z Levinson, A Burbine, E Verduijn… - Journal of Micro …, 2017 - spiedigitallibrary.org
Aberration characterization plays a critical role in the development of any optical system.
State-of-the-art lithography systems have the tightest aberration tolerances. We present an …
State-of-the-art lithography systems have the tightest aberration tolerances. We present an …