Foundations of low-temperature plasma enhanced materials synthesis and etching
Low temperature plasma (LTP)-based synthesis of advanced materials has played a
transformational role in multiple industries, including the semiconductor industry, liquid …
transformational role in multiple industries, including the semiconductor industry, liquid …
Area-selective deposition: fundamentals, applications, and future outlook
This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …
Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors
In this paper, we present the progress in the growth of nanoscale semiconductors grown via
atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD …
atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD …
Area-selective atomic layer deposition assisted by self-assembled monolayers: a comparison of Cu, Co, W, and Ru
Area-selective atomic layer deposition (AS-ALD) is a promising “bottom-up” alternative to
current nanopatterning techniques. Self-assembled monolayers (SAM) have been …
current nanopatterning techniques. Self-assembled monolayers (SAM) have been …
Role of precursor choice on area-selective atomic layer deposition
Area-selective atomic layer deposition (AS-ALD) is a highly sought-after strategy for the
fabrication of next-generation electronics. This work reveals how key precursor design …
fabrication of next-generation electronics. This work reveals how key precursor design …
Improving anti-humidity property of In2O3 based NO2 sensor by fluorocarbon plasma treatment
B Du, T Qi, J Li, Y He, X Yang - Sensors and Actuators B: Chemical, 2021 - Elsevier
Nitrogen dioxide (NO 2) is one of the most dangerous pollutants, which extremely hazard
our health and live environments. In 2 O 3 based chemiresistive gas sensors have been …
our health and live environments. In 2 O 3 based chemiresistive gas sensors have been …
[HTML][HTML] Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
J Li, I Tezsevin, MJM Merkx, JFW Maas… - Journal of Vacuum …, 2022 - pubs.aip.org
Area-selective atomic layer deposition (ALD) is of interest for applications in self-aligned
processing of nanoelectronics. Selective deposition is generally enabled by …
processing of nanoelectronics. Selective deposition is generally enabled by …
Optical absorption property and photo-thermal conversion performance of Ag@ Al2O3 plasmonic nanofluids with Al2O3 nano-shell fabricated by atomic layer …
Abstract In this paper, Ag@ Al 2 O 3 nanoparticles (NPs) were prepared through the atomic
layer deposition (ALD) technique with Al 2 O 3 nano-layers serving as anti-corrosion …
layer deposition (ALD) technique with Al 2 O 3 nano-layers serving as anti-corrosion …
Achieving area-selective atomic layer deposition with fluorinated self-assembled monolayers
In recent years, semiconductor devices have been scaled down to beyond 5 nm nodes
through higher transistor densities and aspect ratios. Therefore, area-selective atomic layer …
through higher transistor densities and aspect ratios. Therefore, area-selective atomic layer …
Area-selective ALD of Ru on nanometer-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films
I Zyulkov, V Madhiwala, E Voronina… - … applied materials & …, 2020 - ACS Publications
The selective deposition of materials on predefined areas on a substrate is of crucial
importance for various applications, such as energy harvesting, microelectronic device …
importance for various applications, such as energy harvesting, microelectronic device …