Phase transition enthalpy measurements of organic and organometallic compounds and ionic liquids. Sublimation, vaporization, and fusion enthalpies from 1880 to …
W Acree, JS Chickos - Journal of Physical and Chemical Reference …, 2017 - pubs.aip.org
This compendium completes a previous report published in 2016 [2016ACR/CHI] on phase
change enthalpies. Paper I of this compendium includes over 6600 organic compounds …
change enthalpies. Paper I of this compendium includes over 6600 organic compounds …
Plasma-enhanced atomic layer deposition of molybdenum oxide thin films at low temperatures for hydrogen gas sensing
JL Wree, D Rogalla, A Ostendorf… - … Applied Materials & …, 2023 - ACS Publications
Molybdenum oxide thin films are very appealing for gas sensing applications due to their
tunable material characteristics. Particularly, the growing demand for develo** hydrogen …
tunable material characteristics. Particularly, the growing demand for develo** hydrogen …
Atomic layer deposition of gold metal
Nanoparticulate gold is a useful material being used in applications like gas-sensing, 1
heterogeneous catalysis, 2 and by virtue of its surface plasmon resonance, photonics. 3 …
heterogeneous catalysis, 2 and by virtue of its surface plasmon resonance, photonics. 3 …
Chemistry of gold (I, III) complexes with organic ligands as potential MOCVD precursors for fabrication of thin metallic films and nanoparticles
TV Basova, A Hassan, NB Morozova - Coordination Chemistry Reviews, 2019 - Elsevier
The present review deals with the chemistry of complexes of gold (I) and gold (III) with
organic ligands. Compounds classified according to the type of coordinating ligands and …
organic ligands. Compounds classified according to the type of coordinating ligands and …
Principles of precursor design for vapour deposition methods
Chemical vapour deposition (CVD) and atomic layer deposition (ALD) are attractive
techniques for depositing a wide spectrum of thin solid film materials, for a broad spectrum of …
techniques for depositing a wide spectrum of thin solid film materials, for a broad spectrum of …
A fit of the vapours
DM Price - Thermochimica Acta, 2015 - Elsevier
The vapour pressures of materials and the enthalpy changes associated with their
sublimation and evaporation are often necessary parameters for many processes. This …
sublimation and evaporation are often necessary parameters for many processes. This …
[HTML][HTML] Direct liquid injection chemical vapor deposition of ZrO2 films from a heteroleptic Zr precursor: Interplay between film characteristics and corrosion protection …
SMJ Beer, D Samelor, AA Aal, J Etzkorn… - journal of materials …, 2021 - Elsevier
The direct liquid injection chemical vapor deposition (DLI-CVD) of uniform and dense
zirconium oxide (ZrO 2) thin films applicable as corrosion protection coatings (CPCs) is …
zirconium oxide (ZrO 2) thin films applicable as corrosion protection coatings (CPCs) is …
Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-heterocyclic carbene precursor
JP Coyle, G Dey, ER Sirianni, ML Kemell… - Chemistry of …, 2013 - ACS Publications
Two novel N-heterocyclic carbene (NHC)-containing copper (I) amides are reported as
atomic layer deposition (ALD) precursors. 1, 3-Diisopropyl-imidazolin-2-ylidene copper …
atomic layer deposition (ALD) precursors. 1, 3-Diisopropyl-imidazolin-2-ylidene copper …
Synthesis, characterization, and thermal study of divalent germanium, tin, and lead triazenides as potential vapor deposition precursors
Only a few M–N bonded divalent group 14 precursors are available for vapor deposition, in
particular for Ge and Pb. A majority of the reported precursors are dicoordinated with the Sn …
particular for Ge and Pb. A majority of the reported precursors are dicoordinated with the Sn …
Atomic layer deposition of dielectric Y 2 O 3 thin films from a homoleptic yttrium formamidinate precursor and water
We report the application of tris (N, N′-diisopropyl-formamidinato) yttrium (III)[Y (DPfAMD)
3] as a promising precursor in a water-assisted thermal atomic layer deposition (ALD) …
3] as a promising precursor in a water-assisted thermal atomic layer deposition (ALD) …