Deep traps in GaN-based structures as affecting the performance of GaN devices

AY Polyakov, IH Lee - Materials Science and Engineering: R: Reports, 2015‏ - Elsevier
New developments in theoretical studies of defects and impurities in III-Nitrides as pertinent
to compensation and recombination in these materials are discussed. New results on …

State-of-the-art and prospective progress of growing AlN substrates by physical vapor transport

X Yao, B Zhang, H Hu, Y Wang, Z Kong, Y Wu… - Journal of Crystal …, 2023‏ - Elsevier
Abstract SiC, GaN, diamond, and AlN known as wide band-gap semiconductors, integrate
the advantages of microelectronics, optoelectronics, and power electronics. The ultra-wide …

A first-principles understanding of point defects and impurities in GaN

JL Lyons, D Wickramaratne… - Journal of Applied …, 2021‏ - pubs.aip.org
Attaining control over the electrical conductivity of gallium nitride through impurity do** is
one of the foremost achievements in semiconductor science. Yet, unwanted contaminants …

Dysprosium-doped cadmium oxide as a gateway material for mid-infrared plasmonics

E Sachet, CT Shelton, JS Harris, BE Gaddy, DL Irving… - Nature materials, 2015‏ - nature.com
The interest in plasmonic technologies surrounds many emergent optoelectronic
applications, such as plasmon lasers, transistors, sensors and information storage. Although …

[HTML][HTML] On compensation in Si-doped AlN

JS Harris, JN Baker, BE Gaddy, I Bryan, Z Bryan… - Applied Physics …, 2018‏ - pubs.aip.org
Controllable n-type do** over wide ranges of carrier concentrations in AlN, or Al-rich
AlGaN, is critical to realizing next-generation applications in high-power electronics and …

Origins of optical absorption and emission lines in AlN

Q Yan, A Janotti, M Scheffler… - Applied Physics …, 2014‏ - pubs.aip.org
To aid the development of AlN-based optoelectronics, it is essential to identify the defects
that cause unwanted light absorption and to minimize their impact. Using hybrid functional …

[HTML][HTML] High electron mobility in AlN: Si by point and extended defect management

P Bagheri, C Quiñones-Garcia, D Khachariya… - Journal of Applied …, 2022‏ - pubs.aip.org
High room temperature n-type mobility, exceeding 300 cm 2/Vs, was demonstrated in Si-
doped AlN. Dislocations and CN− 1 were identified as the main compensators for AlN grown …

Origination and evolution of point defects in AlN film annealed at high temperature

C Kai, H Zang, J Ben, K Jiang, Z Shi, Y Jia, X Cao… - Journal of …, 2021‏ - Elsevier
While high temperature annealing has been proven to be an effective strategy to reduce
threading dislocation density of AlN film, the point defect induced near-ultraviolet emission …

[HTML][HTML] KOH based selective wet chemical etching of AlN, AlxGa1− xN, and GaN crystals: A way towards substrate removal in deep ultraviolet-light emitting diode

W Guo, R Kirste, I Bryan, Z Bryan, L Hussey… - Applied Physics …, 2015‏ - pubs.aip.org
A controllable and smooth potassium hydroxide-based wet etching technique was
developed for the AlGaN system. High selectivity between AlN and Al x Ga 1− x N (up to …

Tracking of point defects in the full compositional range of AlGaN via photoluminescence spectroscopy

J Hyun Kim, P Bagheri, R Kirste, P Reddy… - … status solidi (a), 2023‏ - Wiley Online Library
A comprehensive energy map as a function of AlGaN composition over the whole alloy
range is presented for commonly observed point defects in nominally intrinsic, n‐, and p …