Effect of dielectric constant and oxide thickness on the performance analysis of symmetric double gate stack-oxide junctionless field effect transistor in subthreshold …

CN Saha, R Fabiha, MS Islam - 2017 International Conference …, 2017 - ieeexplore.ieee.org
In this paper, the potential distribution for symmetric double gate stack-oxide junctionless
field effect transistor (DGS-JLFET) in subthreshold region has been observed. Using the …

Electrical characterization of n-type cylindrical gate all around nanowire junctionless transistor with SiO2 and high-k dielectrics

NE Alias, MA Sule, MLP Tan, A Hamzah… - 2020 IEEE …, 2020 - ieeexplore.ieee.org
In this work, the electrical characteristics of n-type cylindrical gate all around (GAA) nanowire
junctionless transistors (NWJLT) of different gate oxides are investigated and analyzed …

Impact of device parameter variation on the electrical characteristic of n-type junctionless nanowire transistor with high-k dielectrics

MA Sule, M Ramakrishnan, NE Alias… - … Journal of Electrical …, 2020 - section.iaesonline.com
Metallurgical junction and thermal budget are serious constraints in scaling and
performance of conventional metal-oxide-semiconductor field-effect transistor (MOSFET). To …

[PDF][PDF] Impact of gate insulation material and thickness on pocket implanted MOS device

MH Bhuyan - … Journal of Electronics and Communication Engineering, 2021 - wseas.com
This paper reports on the impact study with the variation of the gate insulation material and
thickness on different models of pocket implanted sub-100 nm n-MOS device. The gate …

[PDF][PDF] Comparative Study of Trigate SOI FinFET and Trigate JL SOI FinFET Structures

B Fakhr, SE Hosseini - 2016 - sid.ir
Comparative Study of Trigate SOI FinFET and Trigate JL SOI FinFET Structures Page 1
Comparative Study of Trigate SOI FinFET and Trigate JL SOI FinFET Structures B.Fakhr …

[PDF][PDF] SCEs Investigation of Tri-Gate SOI FinFET in Different Channel Lengthes

B Fakhr, SE Hosseini - 2015 - sid.ir
Abstract compact scaling length for Tri-gate SOI FinFET is presented based on a 3-D
simulation. SCEs of FinFETs can be controlled by changing the gate length. Changing …

[Цитат][C] Simulation Studies on Gate Electrostatics of Junctionless Transistor

S Choudhary - 2018 - National Institute of Technology …