From basics to frontiers: A comprehensive review of plasma-modified and plasma-synthesized polymer films

T Dufour - Polymers, 2023 - mdpi.com
This comprehensive review begins by tracing the historical development and progress of
cold plasma technology as an innovative approach to polymer engineering. The study …

Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies

M Kambara, S Kawaguchi, HJ Lee… - Japanese Journal of …, 2022 - iopscience.iop.org
Low-temperature plasma-processing technologies are essential for material synthesis and
device fabrication. Not only the utilization but also the development of plasma-related …

Control of ion flux-energy distributions by low frequency square-shaped tailored voltage waveforms in capacitively coupled plasmas

P Hartmann, I Korolov, J Escandón-López… - Plasma Sources …, 2022 - iopscience.iop.org
Capacitively coupled plasmas are routinely used in an increasing number of technological
applications, where a precise control of the quantity and the shape of the energy distribution …

The electrical asymmetry effect in electronegative CF4 capacitive RF plasmas operated in the striation mode

XK Wang, R Masheyeva, YX Liu… - Plasma Sources …, 2023 - iopscience.iop.org
Abstract The Electrical Asymmetry Effect (EAE) provides control of the mean ion energy at
the electrodes of multi-frequency capacitively coupled radio frequency plasmas (CCP) by …

[HTML][HTML] Numerical simulation of the argon dielectric barrier discharge driven by dual frequency at atmospheric pressure

B Qi, X Tian, T Zhang, J Wang, Y Wang, J Si, J Tang - AIP Advances, 2023 - pubs.aip.org
Argon dielectric barrier discharge driven by the dual frequency at atmospheric pressure has
been investigated by a 1D fluid model. Temporal evolutions of voltage and charge density …

An experimental and computational study on the ignition process of a pulse modulated dual-RF capacitively coupled plasma operated at various low-frequency …

DH Shi, XK Wang, YX Liu, Z Donkó… - Plasma Sources …, 2024 - iopscience.iop.org
The ignition process of a pulse modulated capacitively coupled argon discharge driven
simultaneously by two radio frequency voltages [12.5 MHz (high frequency) and 2.5 MHz …

On the in-situ determination of the effective secondary electron emission coefficient in low pressure capacitively coupled radio frequency discharges based on the …

R Masheyeva, P Hartmann, LY Luo… - Journal of Physics D …, 2024 - iopscience.iop.org
We present a method for the in-situ determination of the effective secondary electron
emission coefficient (SEEC, γ) in a capacitively coupled plasma (CCP) source based on the …

Vacuum ultraviolet radiation in and from an atmospheric pressure plasma source

Z Donkó - Plasma Sources Science and Technology, 2022 - iopscience.iop.org
This work presents a computational study of the atmospheric pressure plasma of the COST
jet source in He+ 0.1% N 2 buffer gas, incorporating the treatment of the VUV resonant …

Electron dynamics and SiO2 etching profile evolution in capacitive Ar/CHF3 discharges driven by sawtooth-tailored voltage waveforms

W Dong, LQ Song, YF Zhang, L Wang, YH Song… - arxiv preprint arxiv …, 2024 - arxiv.org
The electron dynamics and SiO2 etching profile evolution in capacitively coupled Ar/CHF3
plasmas driven by sawtooth-waveforms are investigated based on a one-dimensional …