This invention provides fundamental science and novel device architectures for surface
plasmon (SP)-based, comple mentary metal oxide semiconductor (CMOS)-compatible …

We report the fabrication of low-loss amorphous silicon photonic wires deposited by plasma
enhanced chemical vapor deposition. Single mode photonic wires were fabricated by …

All-optical networking can be the sole approach to provide the huge bandwidth required for
future networks. The essential elements in such an optical network are optical switches. A …

Amorphous silicon waveguides were obtained by plasma-enhanced chemical vapour
deposition and anisotropic plasma etching. Rectangular multimode waveguides as well as …

Amorphous silicon a-Si was made by ion irradiation of crystalline silicon with 1× 10 15 Xe
ions cm− 2 at 77 K in the 1–4 MeV energy range. Thermal relaxation of the amorphous …

The invention relates to a solid-state lithium-ion thin-? lm electrolyte that, compared to the
current state-of-the-art thin? lm electrolyte, Lipon, exhibits an equal or larger electro …

Waveguides and interferometric light amplitude modulators for application at the 1.3-and
1.55-/spl mu/m fiber communication wavelengths have been fabricated with thin-film …

Alternative sputter target compositions or configurations for thin-film electrolytes are
proposed whereby the sputter target materials system possesses Sufficient electrical …

4,283,216 4,318,938 4,437,966 4,442,144 4,481.265 4,518,661 4,555.456 4,572,873
4,587,225 4,619,680 4,645,726 4,664,993 4,668,593 RE32, 449 4,672.586 4,710,940 …

Related US Application Data(74) Attorney, Agent, or Firm—Dewey & LeBoeuf LLP:(63)
Continuation of application No. 1 1/374.282, filed on Jeff E. Schwartz Jun. 15, 2005, which is …