Pulsed laser vaporization and deposition

PR Willmott, JR Huber - Reviews of Modern Physics, 2000 - APS
Photons have many advantages for vaporizing condensed systems, and laser vaporization
sources have a flexibility not available with other methods. These sources are applied to …

Superconducting RF materials other than bulk niobium: a review

AM Valente-Feliciano - Superconductor Science and Technology, 2016 - iopscience.iop.org
For the past five decades, bulk niobium (Nb) has been the material of choice for
superconducting RF (SRF) cavity applications. Alternatives such as Nb thin films and other …

A structure zone diagram including plasma-based deposition and ion etching

A Anders - Thin Solid Films, 2010 - Elsevier
An extended structure zone diagram is proposed that includes energetic deposition,
characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high …

Ion beams in silicon processing and characterization

E Chason, ST Picraux, JM Poate, JO Borland… - Journal of applied …, 1997 - pubs.aip.org
General trends in integrated circuit technology toward smaller device dimensions, lower
thermal budgets, and simplified processing steps present severe physical and engineering …

Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

K Ellmer, T Welzel - Journal of Materials Research, 2012 - cambridge.org
Transparent conductive oxides (TCOs) are degenerately doped compound semiconductors
with wide band gaps (Eg> 3 eV), which are used as transparent electrodes in optoelectronic …

Deposition of complex multielemental thin films

PR Willmott - Progress in Surface Science, 2004 - Elsevier
Modern condensed-matter physics is increasingly concerned with the design, synthesis,
analysis, and exploitation of chemically complex materials and structures. Complex metal …

[HTML][HTML] The role of plasma in plasma-enhanced atomic layer deposition of crystalline films

DR Boris, VD Wheeler, N Nepal, SB Qadri… - Journal of Vacuum …, 2020 - pubs.aip.org
The inclusion of plasma in atomic layer deposition processes generally offers the benefit of
substantially reduced growth temperatures and greater flexibility in tailoring the gas-phase …

Ion beam assisted thin film deposition

JK Hirvonen - Materials Science Reports, 1991 - Elsevier
Ion beam technologies have made tremendous gains in the commercial sector over the past
two decades. The ion implantation of semiconductors rapidly became an accepted …

[LIBRO][B] Materials processing handbook

JR Groza, JF Shackelford - 2007 - books.google.com
A wide-ranging, one-stop resource, the Materials Processing Handbook provides
groundbreaking coverage of processes applied to a myriad of solid materials. It presents the …

Thin film deposition using energetic ions

D Manova, JW Gerlach, S Mändl - Materials, 2010 - mdpi.com
One important recent trend in deposition technology is the continuous expansion of
available processes towards higher ion assistance with the subsequent beneficial effects to …