Residual stresses in deposited thin-film material layers for micro-and nano-systems manufacturing
M Huff - Micromachines, 2022 - mdpi.com
This review paper covers a topic of significant importance in micro-and nano-systems
development and manufacturing, specifically the residual stresses in deposited thin-film …
development and manufacturing, specifically the residual stresses in deposited thin-film …
Integrated silicon photonic MEMS
Silicon photonics has emerged as a mature technology that is expected to play a key role in
critical emerging applications, including very high data rate optical communications …
critical emerging applications, including very high data rate optical communications …
A critical review of microscale mechanical testing methods used in the design of microelectromechanical systems
VT Srikar, SM Spearing - Experimental mechanics, 2003 - Springer
Microelectromechanical systems (MEMS) technologies are evolving at a rapid rate with
increasing activity in the design, fabrication, and commercialization of a wide variety of …
increasing activity in the design, fabrication, and commercialization of a wide variety of …
The mechanical properties of atomic layer deposited alumina for use in micro-and nano-electromechanical systems
Mechanical characterization of atomic layer deposited (ALD) alumina (Al2O3) for use in
micro-and nano-electromechanical systems has been performed using several …
micro-and nano-electromechanical systems has been performed using several …
CAD challenges for microsensors, microactuators, and microsystems
SD Senturia - Proceedings of the IEEE, 1998 - ieeexplore.ieee.org
In parallel with the development of new technologies, new device configurations, and new
applications for microsensors, microactuators, and microsystems, also referred to as …
applications for microsensors, microactuators, and microsystems, also referred to as …
Polysilicon: a versatile material for microsystems
PJ French - Sensors and actuators A: Physical, 2002 - Elsevier
The initial attraction of polysilicon was the ability to deposit semiconductor layers on a wide
range of substrates. This leads to the development of polysilicon gate MOS, polysilicon …
range of substrates. This leads to the development of polysilicon gate MOS, polysilicon …
[PDF][PDF] Electrostatic pull-in test structure design for in-situ mechanical property measurements of microelectromechanical systems (MEMS)
RK Gupta - 1997 - dspace.mit.edu
M-TEST, an electrostatic pull-in approach for the in-situ mechanical property measurements
of microelectromechanical systems (MEMS), is used to extract the Young's modulus and …
of microelectromechanical systems (MEMS), is used to extract the Young's modulus and …
Optimization of a low-stress silicon nitride process for surface-micromachining applications
A detailed examination of the effects of deposition parameters, using LPCVD, and
subsequent processing on the characteristics of silicon nitride is presented. The properties …
subsequent processing on the characteristics of silicon nitride is presented. The properties …
Surface micromachined tuneable interferometer array
The development of compact light modulators integrated on the same chip as the signal
processing opens many opportunities for combining inter-chip optical communications with …
processing opens many opportunities for combining inter-chip optical communications with …
Overview of residual stress in MEMS structures: Its origin, measurement, and control
Micro-electro-mechanical system (MEMS) technology has radically changed the scale,
performance, and cost of a wide variety of sensors and actuators by taking advantage of …
performance, and cost of a wide variety of sensors and actuators by taking advantage of …