Review on interface engineering of low leakage current and on-resistance for high-efficiency Ga2O3-based power devices

CV Prasad, YS Rim - Materials Today Physics, 2022 - Elsevier
Abstract Beta-Gallium oxide (β-Ga 2 O 3) has emerged as a very feasible semiconductor
material for new explorations, thanks to its advantages of ultra-wide bandgap and diverse …

A state-of-art review on gallium oxide field-effect transistors

R Qiao, H Zhang, S Zhao, L Yuan, R Jia… - Journal of Physics D …, 2022 - iopscience.iop.org
As a promising ultra-wide bandgap (UWBG) semiconductor, gallium oxide (Ga 2 O 3) has
recently aroused increasing attention in the area for high-power electronics, power switch for …

Interface engineering of p-type quaternary metal oxide semiconductor interlayer-embedded β-Ga2O3 Schottky barrier diode

CV Prasad, JH Park, JY Min, W Song, M Labed… - Materials Today …, 2023 - Elsevier
Here, we propose a p-type copper aluminum oxide (p-CuAlO 2) interlayer for the high
breakdown and low leakage current of β-Ga 2 O 3 Schottky barrier diodes (SBDs). The XPS …

An overview of conventional and new advancements in high kappa thin film deposition techniques in metal oxide semiconductor devices

P Devaray, SFWM Hatta, YH Wong - Journal of Materials Science …, 2022 - Springer
In the last three decades, study has seen the evolution of metal oxide semiconductor (MOS)
devices as device geometries have shrunk in line with Moore's law. This device shrunk …

[HTML][HTML] Effects of high temperature annealing on the atomic layer deposited HfO2/β-Ga2O3 (010) interface

HN Masten, JD Phillips, RL Peterson - Journal of Applied Physics, 2022 - pubs.aip.org
Atomic layer deposited HfO 2 is a primary candidate for metal–oxide–semiconductor (MOS)
power devices based on the ultra-wide bandgap semiconductor β-Ga 2 O 3. Here, we …

Improved electrical performance for SiO2/β-Ga2O3 (001) MIS capacitor by post-deposition annealing

Q Zhang, D Zhai, M He, J Lu - Materials Science in Semiconductor …, 2024 - Elsevier
In this study, we have fabricated a high-performance SiO 2/β-Ga 2 O 3 (001) MIS capacitor
and investigated the effect of low-temperature post-deposition annealing (PDA) on its …

Polycrystalline/Amorphous HfO2 Bilayer Structure as a Gate Dielectric for β-Ga2O3 MOS Capacitors

JY Yang, J Ma, CH Lee, G Yoo - IEEE Transactions on Electron …, 2021 - ieeexplore.ieee.org
We report the comparison of the atomic layer deposited polycrystalline (p-)/amorphous (a-)
HfO 2 bilayer gate dielectric with p-HfO 2/a-Al 2 O 3 for enhanced β-Ga 2 O 3 metal oxide …

[PDF][PDF] Study of the behavior and determination of phenol Based on modified carbon pa s te electrode with nickel oxide-nitrogen carbon quantum dots using cyclic …

KI Alabid, HN Nasser - Analytical Methods in …, 2023 - pdfs.semanticscholar.org
The behavior of phenol was s tudied and determined using the modified carbon pa s te
electrode (MCPE) with nickel oxide nanoparticles doped by nitrogen carbon quantum dots …

Temperature-dependent electrical characteristics of β–Ga2O3 trench Schottky barrier diodes via self-reactive etching

W Tang, X Zhang, T He, Y Ma, B Feng… - Journal of Physics D …, 2021 - iopscience.iop.org
High performance β–Ga 2 O 3 trench Schottky barrier diodes (SBDs) were demonstrated
with the employment of a novel etching technique called self-reactive etching (SRE). Owing …

Tailoring Optoelectronic Properties of ZnO Films Through Synergistic Mg and B Co-Do** for Unprecedented High-Performance Transparent Electrode Applications

Y Li, Y Li, X Li, Y Li, Y Fei, Y Yan… - Journal of …, 2023 - ingentaconnect.com
The quest for indium-free transparent conductive electrodes with enhanced optical band
gaps and superior electrical conductivity is imperative for the advancement of flexible …