Block copolymer nanopatterning for nonsemiconductor device applications

GG Yang, HJ Choi, KH Han, JH Kim… - … Applied Materials & …, 2022 - ACS Publications
Block copolymer (BCP) nanopatterning has emerged as a versatile nanoscale fabrication
tool for semiconductor devices and other applications, because of its ability to organize well …

Tribological characteristics and advanced processing methods of textured surfaces: a review

Z Wu, H Bao, Y **ng, L Liu - The International Journal of Advanced …, 2021 - Springer
Surface texture is one of the hot spots in the field of surface tribology. It promotes friction by
storing lubricating oil and abrasive particles, and in some cases it can also improve …

Topographically-designed triboelectric nanogenerator via block copolymer self-assembly

CK Jeong, KM Baek, S Niu, TW Nam, YH Hur… - Nano …, 2014 - ACS Publications
Herein, we report a facile and robust route to nanoscale tunable triboelectric energy
harvesters realized by the formation of highly functional and controllable nanostructures via …

Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

S Ji, L Wan, CC Liu, PF Nealey - Progress in Polymer Science, 2016 - Elsevier
Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …

Decade of 2D-materials-based RRAM devices: a review

MM Rehman, HMMU Rehman, JZ Gul… - … and technology of …, 2020 - Taylor & Francis
Two dimensional (2D) materials have offered unique electrical, chemical, mechanical and
physical properties over the past decade owing to their ultrathin, flexible, and multilayer …

Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application

C Cummins, T Ghoshal, JD Holmes… - Advanced …, 2016 - Wiley Online Library
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …

Block copolymer directed metamaterials and metasurfaces for novel optical devices

A Alvarez‐Fernandez, C Cummins… - Advanced Optical …, 2021 - Wiley Online Library
Optical metamaterials are artificially engineered architectures that exhibit desired optical
properties not found in nature. Bespoke design requires the ability to define shape, size …

Fabrication of sub-3 nm feature size based on block copolymer self-assembly for next-generation nanolithography

J Kwak, AK Mishra, J Lee, KS Lee, C Choi… - …, 2017 - ACS Publications
For ultrahigh-density storage media and D-RAM, the feature size of lithography should be
much reduced (say less than 10 nm). Though some research groups reported feature size of …

Recent progress in simple and cost‐effective top‐down lithography for≈ 10 nm scale nanopatterns: from edge lithography to secondary sputtering lithography

WB Jung, S Jang, SY Cho, HJ Jeon… - Advanced …, 2020 - Wiley Online Library
The development of a simple and cost‐effective method for fabricating≈ 10 nm scale
nanopatterns over large areas is an important issue, owing to the performance …

Atomic layer deposition beyond thin film deposition technology

S Yasmeen, SW Ryu, SH Lee… - Advanced Materials …, 2023 - Wiley Online Library
Atomic layer deposition (ALD) is well known as the most advanced coating technique so far
due to its unique deposition characteristics, such as uniformity and 3D conformality. ALD is …