Due to various difficult-to-machine materials and increasingly severe machining conditions,
more and more attention has been paid to the physical vapor deposition (PVD) technology …

High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

Thin films, ubiquitous in today's world, have a documented history of more than 5000 years.
However, thin-film growth by sputter deposition, which required the development of vacuum …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

Magnetron sputtering has become the process of choice for the deposition of a wide range
of industrially important coatings. Examples include hard, wear-resistant coatings, low …

This paper attempts to give an overview of gas discharge plasmas in a broad perspective. It
is meant for plasma spectroscopists who are familiar with analytical plasmas (glow …

In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over
the last years as it is an emerging physical vapor deposition (PVD) technology that …