Characterization methods for defects and devices in silicon carbide
ME Bathen, CTK Lew, J Woerle, C Dorfer… - Journal of Applied …, 2022 - pubs.aip.org
Significant progress has been achieved with silicon carbide (SiC) high power electronics
and quantum technologies, both drawing upon the unique properties of this material. In this …
and quantum technologies, both drawing upon the unique properties of this material. In this …
[HTML][HTML] Charge pum** electrically detected magnetic resonance of silicon carbide power transistors
Silicon carbide (SiC) power devices are becoming central components in high voltage
electronics. However, defects at interfaces and in the bulk continue to severely impact their …
electronics. However, defects at interfaces and in the bulk continue to severely impact their …
A new analytical tool for the study of radiation effects in 3-D integrated circuits: Near-zero field magnetoresistance spectroscopy
We demonstrate that a new technique, near-zero field magnetoresistance (NZFMR)
spectroscopy, can explore radiation damage in a wide variety of devices in a proof-of …
spectroscopy, can explore radiation damage in a wide variety of devices in a proof-of …
[HTML][HTML] Extraction of isotropic electron-nuclear hyperfine coupling constants of paramagnetic point defects from near-zero field magnetoresistance spectra via least …
We report on a method by which we can systematically extract spectroscopic information
such as isotropic electron–nuclear hyperfine coupling constants from near-zero field …
such as isotropic electron–nuclear hyperfine coupling constants from near-zero field …
Combining electrically detected magnetic resonance techniques to study atomic-scale defects generated by hot-carrier stressing in HfO2/SiO2/Si transistors
This work explores the atomic-scale nature of defects within hafnium dioxide/silicon
dioxide/silicon (HfO2/SiO2/Si) transistors generated by hot-carrier stressing. The defects are …
dioxide/silicon (HfO2/SiO2/Si) transistors generated by hot-carrier stressing. The defects are …
Charge Pum** Under Spin Resonance in Metal-Oxide-Semiconductor Transistors
Gate-pulse-induced recombination, known as charge pum** (CP), is a fundamental
carrier recombination process, and has been utilized as a method for analyzing the electrical …
carrier recombination process, and has been utilized as a method for analyzing the electrical …
A new approach to electrically detected magnetic resonance: Spin-dependent transient spectroscopy
Electrically detected magnetic resonance (EDMR) is arguably the most sensitive method
available to study electrically active point defects in semiconductor devices. Most EDMR …
available to study electrically active point defects in semiconductor devices. Most EDMR …
Multiple-photon transitions in electrically detected magnetic resonance measurements of transistors
We report an ultralow-field frequency-swept electrically detected magnetic resonance
(fsEDMR) measurement scheme sensitive to so-called ultrastrong coupling in paramagnetic …
(fsEDMR) measurement scheme sensitive to so-called ultrastrong coupling in paramagnetic …
Near-zero-field magnetoresistance measurements: A simple method to track atomic-scale defects involved in metal-oxide-semiconductor device reliability
We demonstrate the ability of a relatively new analytical technique, near-zero-field
magnetoresistance (NZFMR), to track atomic-scale phenomena involved in the high-field …
magnetoresistance (NZFMR), to track atomic-scale phenomena involved in the high-field …
Electrically detected magnetic resonance study of barium and nitric oxide treatments of 4H-SiC metal-oxide-semiconductor field-effect transistors
We report on the effects of barium interfacial layer (IL) deposition and nitric oxide (NO)
anneals on interface/near-interface defects in 4H-SiC metal-oxide-semiconductor field-effect …
anneals on interface/near-interface defects in 4H-SiC metal-oxide-semiconductor field-effect …