Metal oxide resistive memory switching mechanism based on conductive filament properties
G Bersuker, DC Gilmer, D Veksler, P Kirsch… - Journal of Applied …, 2011 - pubs.aip.org
By combining electrical, physical, and transport/atomistic modeling results, this study
identifies critical conductive filament (CF) features controlling TiN/HfO 2/TiN resistive …
identifies critical conductive filament (CF) features controlling TiN/HfO 2/TiN resistive …
Structural transitions of the metal-oxide nodes within metal–organic frameworks: On the local structures of NU-1000 and UiO-66
In situ pair distribution function (PDF) analyses and density functional theory (DFT)
computations are used to probe local structural transitions of M6O8 nodes found in two …
computations are used to probe local structural transitions of M6O8 nodes found in two …
Resistive switching in hafnium dioxide layers: Local phenomenon at grain boundaries
Overcoming challenges associated with implementation of resistive random access memory
technology for non-volatile information storage requires identifying the material …
technology for non-volatile information storage requires identifying the material …
Monoclinic to tetragonal transformations in hafnia and zirconia: A combined calorimetric and density functional study
We use a combination of density functional theory and calorimetric measurements to
investigate the monoclinic to tetragonal transition in hafnia and zirconia. We measure the …
investigate the monoclinic to tetragonal transition in hafnia and zirconia. We measure the …
Grain boundary-driven leakage path formation in HfO2 dielectrics
The evolution over time of the leakage current in HfO2-based MIM capacitors under
continuous or periodic constant voltage stress (CVS) was studied for a range of stress …
continuous or periodic constant voltage stress (CVS) was studied for a range of stress …
Reduction of Electrical Defects in Atomic Layer Deposited HfO2 Films by Al Do**
The gate leakage current density (J g) of ultrathin (∼ 3 nm) Al-doped HfO2 (Al: HfO2) films
with an Al concentration of∼ 11% was lower than that of the control HfO2 film by 2 orders of …
with an Al concentration of∼ 11% was lower than that of the control HfO2 film by 2 orders of …
XANES, EXAFS and photoluminescence investigations on the amorphous Eu: HfO2
We report detailed investigations on the local electronic/atomic structure and
photoluminescence properties of chemically synthesized Eu: HfO 2 powders. X-ray …
photoluminescence properties of chemically synthesized Eu: HfO 2 powders. X-ray …
Electronic structure study of Ce 1− x A x O 2 (A= Zr & Hf) nanoparticles: NEXAFS and EXAFS investigations
Single phase nanoparticles (NPs) of CeO2, Ce0. 5Zr0. 5O2, Ce0. 5Hf0. 5O2 and Ce0. 5Hf0.
25Zr0. 25O2 were successfully synthesized by co-precipitation method at constant pH and …
25Zr0. 25O2 were successfully synthesized by co-precipitation method at constant pH and …
TiNx/HfO2 interface dipole induced by oxygen scavenging
VV Afanas'ev, A Stesmans, L Pantisano… - Applied Physics …, 2011 - pubs.aip.org
Electron barrier height measurements at TiN x/HfO 2 interfaces in metal-insulator-metal
structures using internal photoemission of electrons reveal a significant (≈ 1 eV, ie, about …
structures using internal photoemission of electrons reveal a significant (≈ 1 eV, ie, about …
Atomic layer deposition of HfO2 films using carbon-free tetrakis (tetrahydroborato) hafnium and water
Thin hafnium oxide films were prepared by atomic layer deposition using a carbon-free
precursor, tetrakis (tetrahydroborato) hafnium [Hf (BH 4) 4], and H 2 O. Film growth was …
precursor, tetrakis (tetrahydroborato) hafnium [Hf (BH 4) 4], and H 2 O. Film growth was …