Wide-bandgap semiconductor materials: For their full bloom

S Fujita - Japanese journal of applied physics, 2015 - iopscience.iop.org
Wide-bandgap semiconductors are expected to be applied to solid-state lighting and power
devices, supporting a future energy-saving society. While GaN-based white LEDs have …

Silica on silicon carbide

V Presser, KG Nickel - Critical reviews in solid state and materials …, 2008 - Taylor & Francis
Silicon carbide (SiC) as both the most important non-oxide ceramic and promising
semiconductor material grows stoichiometric SiO 2 as its native oxide. During passive …

Improved inversion channel mobility for 4H-SiC MOSFETs following high temperature anneals in nitric oxide

GY Chung, CC Tin, JR Williams… - IEEE Electron …, 2001 - ieeexplore.ieee.org
Results presented in this letter demonstrate that the effective channel mobility of lateral,
inversion-mode 4H-SiC MOSFETs is increased significantly after passivation of SiC/SiO/sub …

Status and prospects for SiC power MOSFETs

JA Cooper, MR Melloch, R Singh… - … on Electron Devices, 2002 - ieeexplore.ieee.org
SiC electronic device technology has made rapid progress during the past decade. In this
paper, we review the evolution of SiC power MOSFETs between 1992 and the present …

[КНИГА][B] Gallium nitride and silicon carbide power devices

BJ Baliga - 2016 - books.google.com
During the last 30 years, significant progress has been made to improve our understanding
of gallium nitride and silicon carbide device structures, resulting in experimental …

Design and formation of SiC (0001)/SiO2 interfaces via Si deposition followed by low-temperature oxidation and high-temperature nitridation

T Kobayashi, T Okuda, K Tachiki, K Ito… - Applied Physics …, 2020 - iopscience.iop.org
We report an effective approach to reduce defects at a SiC/SiO 2 interface. Since oxidation
of SiC may inevitably lead to defect creation, the idea is to form the interface without …

The mechanism of defect creation and passivation at the SiC/SiO2 interface

P Deák, JM Knaup, T Hornos, C Thill… - Journal of Physics D …, 2007 - iopscience.iop.org
From the viewpoint of application in power electronics, SiC possesses the greatest
advantage of having SiO 2 as its native oxide. Unfortunately, the usual thermal oxidation …

Native point defects and carbon clusters in 4H-SiC: A hybrid functional study

T Kobayashi, K Harada, Y Kumagai, F Oba… - Journal of Applied …, 2019 - pubs.aip.org
We report first-principles calculations that clarify the formation energies and charge
transition levels of native point defects and carbon clusters in the 4H polytype of silicon …

Nature of intrinsic and extrinsic electron trap** in SiO

AM El-Sayed, MB Watkins, VV Afanas' ev, AL Shluger - Physical Review B, 2014 - APS
Using classical and ab initio calculations we demonstrate that extra electrons can be
trapped in pure crystalline and amorphous SiO 2 (a-SiO 2) in deep band gap states. The …

Hall mobility and free electron density at the interface in 4H–SiC

NS Saks, AK Agarwal - Applied Physics Letters, 2000 - pubs.aip.org
The electron mobility and free electron density have been measured in 4H–and 6H–SiC
metal-oxide-semiconductor inversion layers using the Hall effect. The 4H–SiC inversion …