Wide-bandgap semiconductor materials: For their full bloom
S Fujita - Japanese journal of applied physics, 2015 - iopscience.iop.org
Wide-bandgap semiconductors are expected to be applied to solid-state lighting and power
devices, supporting a future energy-saving society. While GaN-based white LEDs have …
devices, supporting a future energy-saving society. While GaN-based white LEDs have …
Silica on silicon carbide
Silicon carbide (SiC) as both the most important non-oxide ceramic and promising
semiconductor material grows stoichiometric SiO 2 as its native oxide. During passive …
semiconductor material grows stoichiometric SiO 2 as its native oxide. During passive …
Improved inversion channel mobility for 4H-SiC MOSFETs following high temperature anneals in nitric oxide
GY Chung, CC Tin, JR Williams… - IEEE Electron …, 2001 - ieeexplore.ieee.org
Results presented in this letter demonstrate that the effective channel mobility of lateral,
inversion-mode 4H-SiC MOSFETs is increased significantly after passivation of SiC/SiO/sub …
inversion-mode 4H-SiC MOSFETs is increased significantly after passivation of SiC/SiO/sub …
Status and prospects for SiC power MOSFETs
SiC electronic device technology has made rapid progress during the past decade. In this
paper, we review the evolution of SiC power MOSFETs between 1992 and the present …
paper, we review the evolution of SiC power MOSFETs between 1992 and the present …
[КНИГА][B] Gallium nitride and silicon carbide power devices
BJ Baliga - 2016 - books.google.com
During the last 30 years, significant progress has been made to improve our understanding
of gallium nitride and silicon carbide device structures, resulting in experimental …
of gallium nitride and silicon carbide device structures, resulting in experimental …
Design and formation of SiC (0001)/SiO2 interfaces via Si deposition followed by low-temperature oxidation and high-temperature nitridation
We report an effective approach to reduce defects at a SiC/SiO 2 interface. Since oxidation
of SiC may inevitably lead to defect creation, the idea is to form the interface without …
of SiC may inevitably lead to defect creation, the idea is to form the interface without …
The mechanism of defect creation and passivation at the SiC/SiO2 interface
From the viewpoint of application in power electronics, SiC possesses the greatest
advantage of having SiO 2 as its native oxide. Unfortunately, the usual thermal oxidation …
advantage of having SiO 2 as its native oxide. Unfortunately, the usual thermal oxidation …
Native point defects and carbon clusters in 4H-SiC: A hybrid functional study
We report first-principles calculations that clarify the formation energies and charge
transition levels of native point defects and carbon clusters in the 4H polytype of silicon …
transition levels of native point defects and carbon clusters in the 4H polytype of silicon …
Nature of intrinsic and extrinsic electron trap** in SiO
Using classical and ab initio calculations we demonstrate that extra electrons can be
trapped in pure crystalline and amorphous SiO 2 (a-SiO 2) in deep band gap states. The …
trapped in pure crystalline and amorphous SiO 2 (a-SiO 2) in deep band gap states. The …
Hall mobility and free electron density at the interface in 4H–SiC
NS Saks, AK Agarwal - Applied Physics Letters, 2000 - pubs.aip.org
The electron mobility and free electron density have been measured in 4H–and 6H–SiC
metal-oxide-semiconductor inversion layers using the Hall effect. The 4H–SiC inversion …
metal-oxide-semiconductor inversion layers using the Hall effect. The 4H–SiC inversion …