Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …
suitable for depositing uniform and conformal films on complex three-dimensional …
The use of atomic layer deposition in advanced nanopatterning
Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with
atomic level control of the thickness and an excellent conformality on 3-dimensional …
atomic level control of the thickness and an excellent conformality on 3-dimensional …
Area-selective deposition: fundamentals, applications, and future outlook
This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …
Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …
realizable complementary tool to aid optical patterning of device elements for future …
Self-correcting process for high quality patterning by atomic layer deposition
Nanoscale patterning of materials is widely used in a variety of device applications. Area
selective atomic layer deposition (ALD) has shown promise for deposition of patterned …
selective atomic layer deposition (ALD) has shown promise for deposition of patterned …
Selective deposition of dielectrics: Limits and advantages of alkanethiol blocking agents on metal–dielectric patterns
FS Minaye Hashemi, BR Birchansky… - ACS applied materials & …, 2016 - ACS Publications
Area selective atomic layer deposition has the potential to significantly improve current
fabrication approaches by introducing a bottom-up process in which robust and conformal …
fabrication approaches by introducing a bottom-up process in which robust and conformal …
A new resist for area selective atomic and molecular layer deposition on metal–dielectric patterns
Both area selective atomic layer deposition (ALD) and area selective molecular layer
deposition (MLD) are demonstrated on Cu/SiO2 patterns using octadecylphosphonic acid …
deposition (MLD) are demonstrated on Cu/SiO2 patterns using octadecylphosphonic acid …
Is poly (methyl methacrylate)(PMMA) a suitable substrate for ALD?: A Review
Poly (methyl methacrylate)(PMMA) is a thermoplastic synthetic polymer, which displays
superior characteristics such as transparency, good tensile strength, and processability. Its …
superior characteristics such as transparency, good tensile strength, and processability. Its …
Sequential Regeneration of Self‐Assembled Monolayers for Highly Selective Atomic Layer Deposition
Next generation 3D electronic devices will require novel processing methods. Area selective
atomic layer deposition (ALD) of robust films has the opportunity to play an important role in …
atomic layer deposition (ALD) of robust films has the opportunity to play an important role in …
Chemically enhancing block copolymers for block-selective synthesis of self-assembled metal oxide nanostructures
We report chemical modification of self-assembled block copolymer thin films by ultraviolet
light that enhances the block-selective affinity of organometallic precursors otherwise …
light that enhances the block-selective affinity of organometallic precursors otherwise …