High speed silicon wet anisotropic etching for applications in bulk micromachining: a review

P Pal, V Swarnalatha, AVN Rao, AK Pandey… - Micro and Nano …, 2021 - Springer
Wet anisotropic etching is extensively employed in silicon bulk micromachining to fabricate
microstructures for various applications in the field of microelectromechanical systems …

A comprehensive review on convex and concave corners in silicon bulk micromachining based on anisotropic wet chemical etching

P Pal, K Sato - Micro and Nano Systems Letters, 2015 - Springer
Wet anisotropic etching based silicon micromachining is an important technique to fabricate
freestanding (eg cantilever) and fixed (eg cavity) structures on different orientation silicon …

[КНИГА][B] Silicon wet bulk micromachining for MEMS

P Pal, K Sato - 2017 - taylorfrancis.com
Microelectromechanical systems (MEMS)-based sensors and actuators have become
remarkably popular in the past few decades. Rapid advances have taken place in terms of …

Anisotropic etching of Si

I Zubel - Journal of Micromechanics and Microengineering, 2019 - iopscience.iop.org
In this paper, the structure of silicon crystal and the course of anisotropic etching have been
presented in a simple way. Connections between etching anisotropy and surface …

Modified TMAH based etchant for improved etching characteristics on Si {1 0 0} wafer

V Swarnalatha, AVN Rao, A Ashok… - Journal of …, 2017 - iopscience.iop.org
Wet bulk micromachining is a popular technique for the fabrication of microstructures in
research labs as well as in industry. However, increasing the throughput still remains an …

Surface characteristics optimization during wafer-level backside silicon removal for SOI wafers in 3D integration

BJ Shih, ZY Chen, SP Chang, TY Chen, PJ Sung… - Applied Surface …, 2025 - Elsevier
This study highlights an innovative technique to optimize surface characteristics for backside
silicon removal in three-dimensional (3D) integration. Following the grinding process, the …

Effect of NH2OH on etching characteristics of Si {100} in KOH solution

AVN Rao, V Swarnalatha, A Ashok… - ECS Journal of Solid …, 2017 - iopscience.iop.org
Potassium hydroxide (KOH) and tetramethylammonium hydroxide (TMAH) are most
extensively used etchants for wet anisotropic etching process. Amongst these two etchants …

Evolution of Si crystallographic planes-etching of square and circle patterns in 25 wt% TMAH

MM Smiljanić, Ž Lazić, B Radjenović… - Micromachines, 2019 - mdpi.com
Squares and circles are basic patterns for most mask designs of silicon microdevices.
Evolution of etched Si crystallographic planes defined by square and circle patterns in the …

The effect of monohydric and polyhydric alcohols on silicon anisotropic etching in KOH solutions

I Zubel, KP Rola - Sensors and Actuators A: Physical, 2017 - Elsevier
Tensioactive compounds, such monohydric or polyhydric alcohols cause that with an
increase in their concentration in solutions, surface tension at the liquid-gas interface–γ LG …

Morphological and crystallographic evolution of patterned silicon substrate etched in TMAH solutions

J Shen, Y Chen, F Zhang, D Zhang, Y Gan - Applied Surface Science, 2019 - Elsevier
Wet etching of Si substrate enables fabrication of sophisticated Si microstructures for a
number of applications. However, the detailed anisotropic etching behavior of Si in the …