Recent progress in solar-blind photodetectors based on ultrawide bandgap semiconductors
L Wang, S Xu, J Yang, H Huang, Z Huo, J Li, X Xu… - ACS …, 2024 - ACS Publications
Ultrawide bandgap (UWBG) semiconductors, including Ga2O3, diamond, Al x Ga1–x N/AlN,
featuring bandgaps greater than 4.4 eV, hold significant promise for solar-blind ultraviolet …
featuring bandgaps greater than 4.4 eV, hold significant promise for solar-blind ultraviolet …
Significantly improved high‐temperature energy storage performance of BOPP films by coating nanoscale inorganic layer
T Zhang, H Yu, YH Jung, C Zhang… - Energy & …, 2024 - Wiley Online Library
Biaxially oriented polypropylene (BOPP) is one of the most commonly used commercial
capacitor films, but its upper operating temperature is below 105° C due to the sharply …
capacitor films, but its upper operating temperature is below 105° C due to the sharply …
A review of oriented wurtzite-structure aluminum nitride films
H Yang, J Sun, H Wang, H Li, B Yang - Journal of Alloys and Compounds, 2024 - Elsevier
Aluminum nitride (AlN), distinguished by exceptional mechanical, optical, and electronic
properties, has found extensive applications in diverse domains, including heat dissipation …
properties, has found extensive applications in diverse domains, including heat dissipation …
Ultrathin Pt and Mo films on Al1–xScxN: an interface investigation
Aluminum scandium nitride (Al 1–x Sc x N) with attractive ferroelectric and piezoelectric
properties is a promising material for next-generation device applications. However, the …
properties is a promising material for next-generation device applications. However, the …
Enhancing piezoelectric response in (002)-oriented TaxAl (1− x) N films by magnetron-sputtering composition-tunable AlTa alloys
Aluminum nitride (AlN) films suffer from poor piezoelectric response due to the local
hexagonal symmetry of wurtzite crystal structure. The fundamental mechanism of improving …
hexagonal symmetry of wurtzite crystal structure. The fundamental mechanism of improving …
Effects of argon/nitrogen sputtering gas on the microstructural, crystallographic and piezoelectric properties of AlN thin films
The growth of highly crystalline c-plane AlN‹ 002› is extremely difficult, entailing high
temperature and ultra-high vacuum condition. In sputtering technique, the addition of …
temperature and ultra-high vacuum condition. In sputtering technique, the addition of …
Preparation and Structural Investigation of Ultra-Uniform Mo Films on a Si/SiO2 Wafer by the Direct-Current Magnetron Sputtering Method
Z Cheng, A Wang, H Bo, M Wang, J He… - Crystal Growth & …, 2023 - ACS Publications
As a kind of important strategic resource, molybdenum (Mo) and its alloys are widely applied
in solar cells and 5G radio frequency filters. In order to improve the yield of industrial …
in solar cells and 5G radio frequency filters. In order to improve the yield of industrial …
The evolution of preferred orientation and morphology of AlN films under various sputtering parameters
Wurtzite aluminum nitride (AlN) films with (1 0 0) and (0 0 2) preferred orientations are
obtained on Si (1 0 0) wafers by radio frequency magnetron sputtering. The effects of target …
obtained on Si (1 0 0) wafers by radio frequency magnetron sputtering. The effects of target …
On the microcrystal structure of sputtered Cu films deposited on Si (100) surfaces: experiment and integrated multiscale simulation
G Zhu, M Han, B **ao, Z Gan - Molecules, 2023 - mdpi.com
Sputtered Cu/Si thin films were experimentally prepared at different sputtering pressures
and characterized using X-ray diffraction (XRD) and an atomic force microscope (AFM) …
and characterized using X-ray diffraction (XRD) and an atomic force microscope (AFM) …
High-Q film bulk acoustic resonator with high quality AlN film based on transfer method
Thin film bulk acoustic resonator (FBAR) with high quality factor (Q) is preferred for many
communication applications. AlN film deposited in conventional FBAR fabrication process is …
communication applications. AlN film deposited in conventional FBAR fabrication process is …