Systems and methods are disclosed to process a semicon ductor substrate by fabricating a
first layer on the substrate using macroscale semiconductor fabrication techniques; …

A memory device includes a semiconducting polymer film, which includes an organic
dopant. The semiconducting polymer film has a first side and a second side. The memory …

Systems and methods are disclosed to process a semicon ductor substrate by fabricating a
first layer on the substrate using semiconductor fabrication techniques; fabricating a second …

5,063.521 A 11, 1991 Peterson et al. device on a substrate by genetically engineering first,
second, 5,084,365 A 1/1992 Gratzel et al. third, and fourth viruses each having a plurality of …

US7862624B2 - Nano-particles on fabric or textile - Google Patents US7862624B2 - Nano-particles
on fabric or textile - Google Patents Nano-particles on fabric or textile Download PDF Info …

3,833,894 A 9, 1974 Aviram et al. 4,144,418 A 3, 1979 Girard et al. 4,371,883. A 2f1983
Potember et al. 4,507,672 A 3, 1985 Potember et al. 4,652,894 A 3, 1987 Potember et al …

Systems and methods are disclosed to process a semicon ductor substrate by fabricating a
first layer on the substrate using macroscale semiconductor fabrication techniques; …

SUMMARY 0006 Systems and methods are disclosed to process a Semiconductor
Substrate by fabricating a first layer on the Substrate using macroScale Semiconductor …

It is an object of the present invention to provide a semiconductor device in which data can
be written except when manufacturing the semiconductor device and that counterfeits can …

Primary Examiner Ida M Soward (51) Int. Cl.(74) Attorney, Agent, or Firm Eric J. Robinson;
Robinson HOIL 27/08(2006.01) Intellectual Property Law Office, PC HOIL 29/76(2006.01) …