In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Semiconductors such as elemental silicon allowing both p‐type and n‐type do** are the
backbone of the current microelectronics industry, while the continuous progress in …

Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film
electrodes for Li-ion batteries. In this work, bis (methylcyclopentadienyl) nickel (II)(Ni (MeCp) …

Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific
compositions with precise structures and controlled interfaces. This will enable the …

Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are
regarded as promising anode materials for high-performance lithium-ion batteries (LIBs) …

Anion exchange membrane water electrolysis (AEMWE) is a promising technology for
renewable electricity-driven water splitting toward hydrogen production. However …

The possibility of producing stable thin films, only a few atomic layers thick, from a variety of
materials beyond graphene has led to two-dimensional (2D) materials being studied …

Hybrid lead halide perovskite solar cells (PSCs) stand out in terms of their high efficiency,
yet the limited stability and process scalability pose challenges to their commercialization …

The first atomic layer deposition process for a ternary oxide is reported, which contains a
metal of the platinum group, the delafossite PtCoO2. The deposition with the precursors …

Atomic layer deposition (ALD) is a special type of chemical vapor deposition (CVD)
technique that can grow uniformed thin films on a substrate through alternate self-limiting …