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Atomistic modeling approach for predicting association of photoacid generators in extreme ultraviolet polymeric photoresists
BP Prajwal, JM Blackwell, P Theofanis… - Chemistry of …, 2023 - ACS Publications
This work advances a computational framework to probe the molecular inhomogeneities that
occur in chemically amplified photoresists intended for ultraviolet (EUV) lithography …
occur in chemically amplified photoresists intended for ultraviolet (EUV) lithography …