3-D integration and through-silicon vias in MEMS and microsensors

Z Wang - Journal of Microelectromechanical Systems, 2015 - ieeexplore.ieee.org
After two decades of intensive development, 3-D integration has proven invaluable for
allowing integrated circuits to adhere to Moore's Law without needing to continuously shrink …

Microfabrication Technologies for Nanoinvasive and High‐Resolution Magnetic Neuromodulation

C Ge, T Masalehdan, M Shojaei Baghini… - Advanced …, 2024 - Wiley Online Library
The increasing demand for precise neuromodulation necessitates advancements in
techniques to achieve higher spatial resolution. Magnetic stimulation, offering low signal …

Electrical modeling and characterization of through silicon via for three-dimensional ICs

G Katti, M Stucchi, K De Meyer… - IEEE transactions on …, 2009 - ieeexplore.ieee.org
Three-dimensional ICs provide a promising option to build high-performance compact SoCs
by stacking one or more chips vertically. Through silicon vias (TSVs) form an integral …

Compact AC modeling and performance analysis of through-silicon vias in 3-D ICs

C Xu, H Li, R Suaya, K Banerjee - IEEE Transactions on …, 2010 - ieeexplore.ieee.org
This paper introduces the first comprehensive and accurate compact resistance-inductance-
capacitance-conductance (RLCG) model for through-silicon vias (TSVs) in 3-D ICs valid …

Closed-form expressions of 3-D via resistance, inductance, and capacitance

I Savidis, EG Friedman - IEEE Transactions on Electron …, 2009 - ieeexplore.ieee.org
Closed-form expressions of the resistance, capacitance, and inductance for interplane 3-D
vias are presented in this paper. The closed-form expressions account for the 3-D via length …

Electrical modeling of through silicon and package vias

T Bandyopadhyay, R Chatterjee… - … Conference on 3D …, 2009 - ieeexplore.ieee.org
This paper presents analytical modeling and 3D full-wave electromagnetic (EM) simulation
of the bias voltage dependent semiconductor (MOS) capacitance of a Through Silicon Via …

Rigorous electrical modeling of through silicon vias (TSVs) with MOS capacitance effects

T Bandyopadhyay, KJ Han, D Chung… - IEEE Transactions …, 2011 - ieeexplore.ieee.org
3-D integration of microelectronic systems reduces the interconnect length, wiring delay, and
system size, while enhancing functionality by heterogeneous integration. Through silicon via …

Enhanced compliant probe card systems having improved planarity

JM Haemer, FC Chong, DN Modlin - US Patent 7,349,223, 2008 - Google Patents
2010-07-07 Assigned to NANONEXUS (ASSIGNMENT FOR THE BENEFIT OF
CREDITORS), LLC reassignment NANONEXUS (ASSIGNMENT FOR THE BENEFIT OF …

High density interconnect system for IC packages and interconnect assemblies

WR Bottoms, FC Chong, S Mok, D Modlin - US Patent 7,579,848, 2009 - Google Patents
An improved interconnection system is described. Such as for electrical contactors and
connectors, electronic device or module package assemblies, socket assemblies, and/or …

Through-silicon-via capacitance reduction technique to benefit 3-D IC performance

G Katti, M Stucchi, J Van Olmen… - IEEE Electron …, 2010 - ieeexplore.ieee.org
Through-silicon via (TSV) constitutes a key component interconnecting adjacent dies
vertically to form 3-D integrated circuits. In this letter, we propose a method to exploit the TSV …