Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic
devices for computing and data storage, but also for emerging technologies such as related …

The demand for high-performance devices that are used in electrochemical energy
conversion and storage has increased rapidly. Tremendous efforts, such as adopting new …

A critical step in photocatalytic water dissociation is the hole‐mediated oxidation reaction.
Molecular‐level insights into the mechanism of this complex reaction under realistic …

Despite the rapid increase in the number of newly developed processes, area-selective
atomic layer deposition (ALD) of nitrides is largely unexplored. ALD of nitrides at low …

Atomic layer deposition (ALD) has been traditionally regarded as an extremely powerful but
slow thin-film deposition technique. The (perceived) limitation in terms of deposition rate has …

Membrane-based separation processes are part of most water purification plants worldwide.
Industrial separation applications, primarily water purification and gas separation, can be …

The inclusion of plasma in atomic layer deposition processes generally offers the benefit of
substantially reduced growth temperatures and greater flexibility in tailoring the gas-phase …

This article discusses key elementary surface-reaction processes in state-of-the-art plasma
etching and deposition relevant to nanoelectronic device fabrication and presents a concise …

Two-dimensional MoS2 is a promising material for applications, including electronics and
electrocatalysis. However, scalable methods capable of depositing MoS2 at low …

Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in
the synthesis of nanoscale films with precise growth control. Apart from the well-established …