A review of technologies and design techniques of millimeter-wave power amplifiers

V Camarchia, R Quaglia, A Piacibello… - IEEE Transactions …, 2020 - ieeexplore.ieee.org
This article reviews the state-of-the-art millimeter-wave (mm-wave) power amplifiers (PAs),
focusing on broadband design techniques. An overview of the main solid-state technologies …

GaN-based power high-electron-mobility transistors on Si substrates: From materials to devices

N Wu, Z **ng, S Li, L Luo, F Zeng… - … Science and Technology, 2023 - iopscience.iop.org
Conventional silicon (Si)-based power devices face physical limitations—such as switching
speed and energy efficiency—which can make it difficult to meet the increasing demand for …

A temperature stable amplifier characteristics of AlGaN/GaN HEMTs on 3C-SiC/Si

A Bose, D Biswas, S Hishiki, S Ouchi, K Kitahara… - IEEE …, 2021 - ieeexplore.ieee.org
A high temperature stable amplifier characteristics for L-band or 2 GHz was studied using
AlGaN/GaN high electron mobility transistors (HEMTs) on 3C-SiC/Si substrate. A crack free …

Origin (s) of anomalous substrate conduction in MOVPE-Grown GaN HEMTs on highly resistive silicon

S Ghosh, A Hinz, SM Fairclough… - ACS Applied …, 2021 - ACS Publications
The performance of transistors designed specifically for high-frequency applications is
critically reliant upon the semi-insulating electrical properties of the substrate. The suspected …

Electrical activity at the AlN/Si Interface: identifying the main origin of propagation losses in GaN-on-Si devices at microwave frequencies

M Bah, D Valente, M Lesecq, N Defrance… - Scientific Reports, 2020 - nature.com
AlN nucleation layers are the basement of GaN-on-Si structures grown for light-emitting
diodes, high frequency telecommunication and power switching systems. In this context, our …

Fluorine plasma treatment for AlGaN/GaN HEMT-based ultraviolet photodetector with high responsivity and high detectivity

K Zhou, L Shan, Y Zhang, D Lu, Y Ma… - IEEE Electron …, 2023 - ieeexplore.ieee.org
AlGaN/GaN high electron mobility transistor (HEMT) has attracted great attention in
ultraviolet photodetectors (UVPDs) due to the ultrahigh responsivity and high photocurrent …

AlInGaN/GaN HEMTs with high Johnson's figure-of-merit on low resistivity silicon substrate

I Sanyal, ES Lin, YC Wan, KM Chen… - IEEE Journal of the …, 2020 - ieeexplore.ieee.org
This work demonstrates high-performance AlInGaN/AlN/GaN high electron mobility
transistors grown on 150 mm p-type low resistivity (resistivity~ 20-100 Ω-cm) silicon …

Substrate effects in GaN-on-silicon RF device technology

H Chandrasekar - International Journal of High Speed Electronics …, 2019 - World Scientific
The influence of the semiconducting Si substrate on the performance of GaN-on-Si RF
technology is reviewed. Firstly, the formation of a parasitic conduction channel at the …

RF loss reduction by a carbon-regulated Si substrate engineering in GaN-based HEMT buffer stacks

Z Cai, X Yang, Z Shen, C Ma, Z Chen, D Liu… - Applied Physics …, 2023 - pubs.aip.org
A carbon-regulated Si substrate engineering has been adopted to reduce the RF loss of
GaN-based HEMT buffer stacks. By implanting the substrate with high-dose carbon …

Ultralow-supersaturation Al pretreatment toward low dislocation density and low radio frequency loss GaN/AlN epi-stacks on high-resistivity Si substrates

Z Cai, X Yang, C Ma, Z Chen, D Liu… - ACS Applied …, 2022 - ACS Publications
An ultralow-supersaturation Al pretreatment approach has been proposed to achieve low
threading dislocation (TD) density and low radio frequency (RF) loss GaN/AlN layer stacks …