Defect engineering in SiC technology for high-voltage power devices

T Kimoto, H Watanabe - Applied Physics Express, 2020 - iopscience.iop.org
Major features of silicon carbide (SiC) power devices include high blocking voltage, low on-
state loss, and fast switching, compared with those of the Si counterparts. Through recent …

Material science and device physics in SiC technology for high-voltage power devices

T Kimoto - Japanese Journal of Applied Physics, 2015 - iopscience.iop.org
Power semiconductor devices are key components in power conversion systems. Silicon
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …

A review of SiC IGBT: models, fabrications, characteristics, and applications

L Han, L Liang, Y Kang, Y Qiu - IEEE Transactions on Power …, 2020 - ieeexplore.ieee.org
Along with the increasing maturity for the material and process of the wide bandgap
semiconductor silicon carbide (SiC), the insulated gate bipolar transistor (IGBT) representing …

Time dependence of bias-stress-induced SiC MOSFET threshold-voltage instability measurements

AJ Lelis, D Habersat, R Green… - IEEE transactions on …, 2008 - ieeexplore.ieee.org
We have observed significant instability in the threshold voltage of 4H-SiC metal-oxide-
semiconductor field-effect transistors due to gate-bias stressing. This effect has a strong …

Characterization of SiO2/4H-SiC Interfaces in 4H-SiC MOSFETs: A Review

P Fiorenza, F Giannazzo, F Roccaforte - Energies, 2019 - mdpi.com
This paper gives an overview on some state-of-the-art characterization methods of SiO2/4H-
SiC interfaces in metal oxide semiconductor field effect transistors (MOSFETs). In particular …

Synchrotron x-ray photoelectron spectroscopy study on thermally grown SiO2/4H-SiC (0001) interface and its correlation with electrical properties

H Watanabe, T Hosoi, T Kirino, Y Kagei… - Applied Physics …, 2011 - pubs.aip.org
The correlation between atomic structure and the electrical properties of thermally grown
SiO 2/4H-SiC (0001) interfaces was investigated by synchrotron x-ray photoelectron …

Inversion layer carrier concentration and mobility in 4H–SiC metal-oxide-semiconductor field-effect transistors

S Dhar, S Haney, L Cheng, SR Ryu… - Journal of Applied …, 2010 - pubs.aip.org
Free electron concentration and carrier mobility measurements on 4H–SiC metal-oxide-
semiconductor inversion layers are reported in this article. The key finding is that in state-of …

Radiation-induced defect accumulation and annealing in Si-implanted gallium oxide

SB Kjeldby, A Azarov, PD Nguyen… - Journal of Applied …, 2022 - pubs.aip.org
Defect accumulation and annealing phenomena in Si-implanted monoclinic gallium oxide (β-
Ga 2 O 3) wafers, having (2 01)⁠,(010), and (001) orientations, were studied by Rutherford …

An electrically detected magnetic resonance study of performance limiting defects in SiC metal oxide semiconductor field effect transistors

CJ Cochrane, PM Lenahan, AJ Lelis - Journal of Applied Physics, 2011 - pubs.aip.org
In this study, we utilize electrically detected magnetic resonance (EDMR) techniques and
electrical measurements to study defects in SiC based metal oxide semiconductor field effect …

Relationship between 4H-SiC∕ SiO2 transition layer thickness and mobility

TL Biggerstaff, CL Reynolds, T Zheleva, A Lelis… - Applied Physics …, 2009 - pubs.aip.org
The interfacial region between silicon carbide (SiC) and its native oxide contains a high
density of interfacial traps, which is considered a major problem leading to a lower mobility …