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Computational approach for plasma process optimization combined with deep learning model
As semiconductor device structures become more complex and sophisticated, the formation
of finer and deeper patterns is required. To achieve a higher yield for mass production as the …
of finer and deeper patterns is required. To achieve a higher yield for mass production as the …
Deep neural network-based reduced-order modeling of ion–surface interactions combined with molecular dynamics simulation
With the advent of complex and sophisticated architectures in semiconductor device
manufacturing, atomic-resolution accuracy and precision are commonly required for …
manufacturing, atomic-resolution accuracy and precision are commonly required for …
Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces
CMD Cagomoc, M Isobe, EA Hudson… - Journal of Vacuum …, 2023 - pubs.aip.org
Molecular dynamics simulations for the scattering of neon, argon, and xenon ions on silicon
and silicon dioxide surfaces were performed at grazing incidence to examine how the …
and silicon dioxide surfaces were performed at grazing incidence to examine how the …
Deep Learning Predicts Ar/O₂ Plasma in Inductively Coupled Plasma Discharge
SB Lee, JH Kim, G Kim, JW Park, BK Chae… - Applied Science and …, 2023 - dbpia.co.kr
This study proposes a model that combines deep learning (DL) techniques with plasma
simulations to efficiently investigate optimal process conditions. The DL model was trained …
simulations to efficiently investigate optimal process conditions. The DL model was trained …
플라즈마 제어를 위한 AI 지능화 기술
박민호 - 진공이야기, 2024 - dbpia.co.kr
박민호 저자는 2017 년 서울대학교에서 핵융합 플라즈마로 석사 학위를 받았으며, 2017 년~
2021 년 Tmax AI 에서 AI 연구실장, 2021 년~ 2022 년 삼성전자 설비기술연구소 Plasma Lab …
2021 년 Tmax AI 에서 AI 연구실장, 2021 년~ 2022 년 삼성전자 설비기술연구소 Plasma Lab …