Computational approach for plasma process optimization combined with deep learning model

J Ko, J Bae, M Park, Y Jo, H Lee, K Kim… - Journal of Physics D …, 2023 - iopscience.iop.org
As semiconductor device structures become more complex and sophisticated, the formation
of finer and deeper patterns is required. To achieve a higher yield for mass production as the …

Deep neural network-based reduced-order modeling of ion–surface interactions combined with molecular dynamics simulation

B Kim, J Bae, H Jeong, SH Hahn, S Yoo… - Journal of Physics D …, 2023 - iopscience.iop.org
With the advent of complex and sophisticated architectures in semiconductor device
manufacturing, atomic-resolution accuracy and precision are commonly required for …

Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces

CMD Cagomoc, M Isobe, EA Hudson… - Journal of Vacuum …, 2023 - pubs.aip.org
Molecular dynamics simulations for the scattering of neon, argon, and xenon ions on silicon
and silicon dioxide surfaces were performed at grazing incidence to examine how the …

Deep Learning Predicts Ar/O₂ Plasma in Inductively Coupled Plasma Discharge

SB Lee, JH Kim, G Kim, JW Park, BK Chae… - Applied Science and …, 2023 - dbpia.co.kr
This study proposes a model that combines deep learning (DL) techniques with plasma
simulations to efficiently investigate optimal process conditions. The DL model was trained …

플라즈마 제어를 위한 AI 지능화 기술

박민호 - 진공이야기, 2024 - dbpia.co.kr
박민호 저자는 2017 년 서울대학교에서 핵융합 플라즈마로 석사 학위를 받았으며, 2017 년~
2021 년 Tmax AI 에서 AI 연구실장, 2021 년~ 2022 년 삼성전자 설비기술연구소 Plasma Lab …