Progress, challenges, and opportunities in oxide semiconductor devices: a key building block for applications ranging from display backplanes to 3D integrated …

T Kim, CH Choi, JS Hur, D Ha, BJ Kuh, Y Kim… - Advanced …, 2023 - Wiley Online Library
As Si has faced physical limits on further scaling down, novel semiconducting materials such
as 2D transition metal dichalcogenides and oxide semiconductors (OSs) have gained …

Thin‐Film Transistors for Integrated Circuits: Fundamentals and Recent Progress

A Yan, C Wang, J Yan, Z Wang, E Zhang… - Advanced Functional …, 2024 - Wiley Online Library
High‐performance thin‐film transistors (TFTs) integrated circuits (ICs) have become
increasingly necessary to meet the emerging demands such as healthcare, edge computing …

Ultrathin InGaO thin film transistors by atomic layer deposition

J Zhang, D Zheng, Z Zhang, A Charnas… - IEEE Electron …, 2022 - ieeexplore.ieee.org
In this letter, we report on scaled ultrathin (~ 3 nm) InGaO (IGO) thin film transistors (TFTs) by
atomic layer deposition (ALD) under a low thermal budget of 250° C. The ALD-derived IGO …

Strong Immunity to Drain-Induced Barrier Lowering in ALD-Grown Preferentially Oriented Indium Gallium Oxide Transistors

GB Kim, T Kim, SW Bang, JS Hur, CH Choi… - … Applied Materials & …, 2024 - ACS Publications
Drain-induced barrier lowering (DIBL) is one of the most critical obstacles degrading the
reliability of integrated circuits based on miniaturized transistors. Here, the effect of a …

Tunable transmissive metasurface based on thin-film lithium niobate

Z Chen, N Mazurski, J Engelberg, U Levy - ACS Photonics, 2024 - ACS Publications
In this work, we present a free-space transmissive light amplitude modulator based on thin-
film lithium niobate on an insulator platform with an indium tin oxide meta-grating. The …

High-performance short-channel top-gate indium-tin-oxide transistors by optimized gate dielectric

C Gu, Q Hu, S Zhu, Q Li, M Zeng, H Liu… - IEEE Electron …, 2023 - ieeexplore.ieee.org
In this work, high-performance top-gate indium-tin-oxide (ITO) transistors with high carrier
mobility of 60 cm2/have been successfully demonstrated using optimized atomic layer …

Effect of Top-Gate Dielectric Deposition on the Performance of Indium Tin Oxide Transistors

S Wahid, A Daus, J Kwon, S Qin, JS Ko… - IEEE Electron …, 2023 - ieeexplore.ieee.org
We report ultrathin (nm) channel indium tin oxide (ITO) transistors, comparing different
precursors for atomic layer deposition (ALD) of the Al2O3 top-gate dielectric, and analyze …

Back-end-of-line-compatible fin-gate ZnO ferroelectric field-effect transistors

Q Kong, L Liu, Z Zheng, C Sun, Z Zhou… - … on Electron Devices, 2023 - ieeexplore.ieee.org
We report the back-end-of-line (BEOL)-compatible 3-D oxide semiconductor (OS) fin-gate
ferroelectric field-effect transistors (Fe-FETs) featuring atomic layer deposition (ALD)-grown …

Top-gate indium-tin-oxide power transistors featuring high breakdown voltage of 156 V

J **e, Y Wang, Z Zheng, Y Kang, X Chen… - IEEE Electron …, 2024 - ieeexplore.ieee.org
In this letter, a top-gate (TG) indium-tin-oxide (ITO) power field-effect transistor (FET) with
offset design is reported for the first time and carefully investigated by both simulations and …

Effect of Single Spinel Phase Crystallization on Drain-Induced-Barrier-Lowering in Submicron Length IZTO Thin-Film Transistors

GB Kim, T Kim, CH Choi, SW Chung… - IEEE Electron Device …, 2023 - ieeexplore.ieee.org
This study shows the effect of single spinel phase crystallization on drain-induced barrier
lowering (DIBL) of indium-zinc-tin-oxide (IZTO) thin-film transistors (TFTs) with submicron …