Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …

1. INTRODUCTION Heterogeneous catalysis, whereby a gas-or liquid-phase reaction is
performed over a solid catalyst, is at the heart of the modern energy and chemical industries …

This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …

Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …

Catalyst synthesis with precise control over the structure of catalytic active sites at the atomic
level is of essential importance for the scientific understanding of reaction mechanisms and …

Al 2 O 3 thin films were grown on highly-doped p-Si (100) macro-and mesoporous structures
by atomic layer deposition (ALD) using trimethylaluminum (TMA) and water H 2 O as …

Supported metal nanoparticles are among the most important cata-lysts for many practical
reactions, including petroleum refining, automobile exhaust treatment, and Fischer–Tropsch …

DOI: 10.1002/adma. 201404314 amphoteric substance, which reacts with both acids and
bases. To achieve superior control using ALD, area-selective deposition can be done, taking …

Supported Pd catalysts are active in catalyzing the highly exothermic methane combustion
reaction but tend to be deactivated owing to local hyperthermal environments. Herein we …

Multi-metallic nanoparticles constitute a new class of materials offering the opportunity to
tune the properties via the composition, atomic ordering and size. In particular, supported …