Layer‐engineered functional multilayer thin‐film structures and interfaces through atomic and molecular layer deposition

M Heikkinen, R Ghiyasi… - Advanced Materials …, 2024 - Wiley Online Library
Atomic layer deposition (ALD) technology is one of the cornerstones of the modern
microelectronics industry, where it is exploited in the fabrication of high‐quality inorganic …

Maxwell–Wagner Relaxation-Driven High Dielectric Constant in Al2O3/TiO2 Nanolaminates Grown by Pulsed Laser Deposition

PS Padhi, SK Rai, H Srivastava… - … Applied Materials & …, 2022 - ACS Publications
Multilayer nanolaminates (NLs) of alternate ultrathin sublayers of Al2O3 and TiO2 (ATA) with
the thickness ranging∼ 2 to 0.5 nm were fabricated by optimized pulsed laser deposition …

Alumina–Titania Nanolaminate Condensers for Hot Programmable Catalysis

KR Oh, A Walton, JA Chalmers, JA Hopkins… - ACS Materials …, 2024 - ACS Publications
N anolaminates composed of thin alternating layers of Al2O3 and TiO2 (ATO) were
engineered by using atomic layer deposition as the dielectric material for a Pt-on-carbon …

Process temperature-dependent interface quality and Maxwell–Wagner interfacial polarization in atomic layer deposited Al 2 O 3/TiO 2 nanolaminates for energy …

PS Padhi, RS Ajimsha, SK Rai, UK Goutam, A Bose… - Nanoscale, 2023 - pubs.rsc.org
Considering the excellent tunability of electrical and dielectric properties in binary metal
oxide based multi-layered nanolaminate structures, a thermal atomic layer deposition …

Deposition of TiO2/Al2O3 bilayer on hydrogenated diamond for electronic devices: Capacitors, field-effect transistors, and logic inverters

JW Liu, MY Liao, M Imura, RG Banal… - Journal of Applied …, 2017 - pubs.aip.org
The wide bandgap semiconductor diamond has been studied to develop high-power and
high-frequency electronic devices. Here, high dielectric constant (high-k) TiO 2/Al 2 O 3 …

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

OME Ylivaara, L Kilpi, X Liu, S Sintonen, S Ali… - Journal of Vacuum …, 2017 - pubs.aip.org
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic
process enable the growth of conformal thin films with precise thickness control and sharp …

Small polaron hop** and tunneling transport in Maxwell–Wagner relaxation dominated Al2O3/TiO2 subnanometric laminates

PS Padhi, SK Rai, K Vijay, H Srivastava… - Applied Physics …, 2024 - pubs.aip.org
Maxwell–Wagner relaxation dominated Al 2 O 3/TiO 2 nanolaminates (ATA NLs) have
recently demonstrated their potential for high-density energy storage applications. In this …

Science and technology of integrated super-high dielectric constant AlOx/TiOy nanolaminates/diamond for MOS capacitors and MOSFETs

J Liu, O Auciello, E de Obaldia, B Da, Y Koide - Carbon, 2021 - Elsevier
A super-high dielectric constant AlO x/TiO y nanolaminate film is grown on hydrogenated
diamond (H-diamond) to enable superior metal-oxide-semiconductor (MOS) capacitors and …

Super high-dielectric-constant oxide films for next-generation nanoelectronics and supercapacitors for energy storage

O Auciello, G Lee, C Wu, Y Chen, JJ Alcantar-Peña… - MRS …, 2020 - cambridge.org
Dielectrics are electrical insulator materials, polarizable by opposite displacement of positive
and negative ionized atoms via electric fields across the material's thickness. Dielectrics are …

Tunable Nanobattery Effect and Negative Differential Resistance Characteristics in Interfacial Polarization-Dominated Al2O3/TiO2 Nanolaminates

PS Padhi, SK Rai, K Vijay, H Srivastava… - ACS Applied Nano …, 2024 - ACS Publications
We report insights into the interface carrier-confinement-assisted dielectric and electrical
properties in atomic-layer-deposited Al2O3/TiO2 nanolaminates (NLs). With progressive …