Silicon nanostructures from electroless electrochemical etching

KW Kolasinski - Current Opinion in Solid State and Materials Science, 2005‏ - Elsevier
Recent advances in the production of Si nanostructures from electroless etching are
reviewed, including stain etching, metal-assisted etching and chemical vapour etching. A …

[معلومات الإصدار][C] Electrochemistry of Silicon and Its Oxide

XG Zhang - 2001‏ - books.google.com
It may be argued that silicon, carbon, hydrogen, oxygen, and iron are among the most
important elements on our planet, because of their involvement in geological, biol-ical, and …

Effect of Water Concentration in LiPF6-Based Electrolytes on the Formation, Evolution, and Properties of the Solid Electrolyte Interphase on Si Anodes

Y Ha, C Stetson, SP Harvey, G Teeter… - … Applied Materials & …, 2020‏ - ACS Publications
A trace amount of water in an electrolyte is one of the factors detrimental to the
electrochemical performance of silicon (Si)-based lithium-ion batteries that adversely affect …

Treatment of acidic wastewater via fluoride ions removal by SiO2 particles followed by phosphate ions recovery using flow-electrode capacitive deionization

A Epshtein, O Nir, L Monat, Y Gendel - Chemical Engineering Journal, 2020‏ - Elsevier
A new process for the treatment of phosphoric acid industry wastewater is proposed. The
technique comprises the following major steps:(1) selective removal of fluoride ions via …

The mechanism of Si etching in fluoride solutions

KW Kolasinski - Physical Chemistry Chemical Physics, 2003‏ - pubs.rsc.org
Several mechanisms for (photo) electrochemical etching of Si in aqueous fluoride solutions
have been proposed. These models are reviewed and quantitative aspects of the kinetics …

Overview and evolution of silicon wafer cleaning technology

W Kern - Handbook of silicon wafer cleaning technology, 2018‏ - Elsevier
This chapter introduces the concept of ultraclean surfaces of silicon for integrated circuit
manufacturing. The evolution of cleaning is outlined, starting in the 1970s with the …

Single Pt nanowire electrode: preparation, electrochemistry, and electrocatalysis

Y Li, Q Wu, S Jiao, C Xu, L Wang - Analytical chemistry, 2013‏ - ACS Publications
A single Pt nanowire electrode (SPNE) was fabricated through HF etching process from Pt
disk nanoelectrode and an underpotential deposition (UPD) redox replacement technique …

Composite polymer-core silica-shell abrasive particles during oxide CMP: a defectivity study

S Armini, CM Whelan, K Maex… - Journal of the …, 2007‏ - iopscience.iop.org
Chemical mechanical planarization (CMP) is a triboelectrochemical process dominated by
mechanical and chemical-assisted wear. The choice of abrasive used in this process is of …

The composition of fluoride solutions

KW Kolasinski - Journal of the Electrochemical Society, 2005‏ - iopscience.iop.org
Aqueous fluoride solutions underpin much of silicon processing because they are used to
strip oxide layers and for cleaning. Depending on their composition and reaction conditions …