[HTML][HTML] A review on the fabrication and reliability of three-dimensional integration technologies for microelectronic packaging: Through-Si-via and solder bum** …
DH Cho, SM Seo, JB Kim, SH Rajendran, JP Jung - Metals, 2021 - mdpi.com
With the continuous miniaturization of electronic devices and the upcoming new
technologies such as Artificial Intelligence (AI), Internet of Things (IoT), fifth-generation …
technologies such as Artificial Intelligence (AI), Internet of Things (IoT), fifth-generation …
Reduction of defects in TSV filled with Cu by high-speed 3-step PPR for 3D Si chip stacking
SC Hong, WG Lee, WJ Kim, JH Kim, JP Jung - Microelectronics Reliability, 2011 - Elsevier
The reduction of defects and high-speed copper filling into a through-silicon-via (TSV) for the
three-dimensional stacking of Si chips were investigated. The via, with a diameter and depth …
three-dimensional stacking of Si chips were investigated. The via, with a diameter and depth …
A review of soft errors and the low α-solder bum** process in 3-D packaging technology
DH Jung, A Sharma, JP Jung - Journal of Materials Science, 2018 - Springer
This study reviews soft errors in modern electronic assemblies, through silicon via (TSV),
and low α-solder bum** techniques for 3-D microelectronic packaging. The TSV …
and low α-solder bum** techniques for 3-D microelectronic packaging. The TSV …
Cu filling of TSV using various current forms for three‐dimensional packaging application
MH Roh, JH Lee, W Kim, J Pil Jung - Soldering & Surface Mount …, 2013 - emerald.com
Purpose–The purpose of this paper is to overview the effect of electroplating current wave
forms on Cu filling of through‐silicon‐vias (TSV) for three‐dimensional (3D) packaging …
forms on Cu filling of through‐silicon‐vias (TSV) for three‐dimensional (3D) packaging …
High-speed Cu filling into TSV and non-PR bum** for 3D chip packaging
SC Hong, WJ Kim, JP Jung - Journal of the Microelectronics and …, 2011 - koreascience.kr
High-speed Cu filling into a through-silicon-via (TSV) and simplification of bum** process
by electroplating for three dimensional stacking of Si dice were investigated. The TSV was …
by electroplating for three dimensional stacking of Si dice were investigated. The TSV was …
Cu-filling behavior in TSV with positions in wafer level
SJ Lee, YJ Jang, JH Lee, JP Jung - Journal of the Microelectronics …, 2014 - koreascience.kr
Through silicon via (TSV) technology is to form a via hole in a silicon chip, and to stack the
chips vertically for three-dimensional (3D) electronics packaging technology. This can …
chips vertically for three-dimensional (3D) electronics packaging technology. This can …
Cu filling into TSV and non-PR Sn bum** for 3 dimension chip packaging
SC Hong, WG Lee, JK Park, WJ Kim… - Journal of Welding and …, 2011 - koreascience.kr
전자기기의 소형화, 고기능화에 맞추어 반도체 소자의 집적도가 크게 증가함에 따라 기존의
평면적 칩 배열에서 3 차원으로 칩을 적층하고자 하는 연구가 활발히진행되고 있다 1). 성능 …
평면적 칩 배열에서 3 차원으로 칩을 적층하고자 하는 연구가 활발히진행되고 있다 1). 성능 …
Non-PR Sn-3.5 Ag Bum** on a Fast Filled Cu-Plug by PPR Current
SC Hong, WG Lee, W Kim… - IEEE Transactions on …, 2013 - ieeexplore.ieee.org
The electroplating of Sn-3.5 wt% Ag bumps without a photoresist (PR) mould on a Si chip
was performed to reduce the production steps and cost for 3-D chip stacking. The …
was performed to reduce the production steps and cost for 3-D chip stacking. The …
[PDF][PDF] 三维系统级封装 (3D-SiP) 中的硅通孔技术研究进展
王美玉, 张浩波, 胡伟波, 梅云辉 - 机械工程学报, 2024 - qikan.cmes.org
随着系统复杂度的不断提高, 传统封装技术已不能满足多芯片, 多器件的高性能互联.
而三维系统级封装(3D-system in package, 3D-SiP) 通过多层堆叠和立体互联实现了芯片和 …
而三维系统级封装(3D-system in package, 3D-SiP) 通过多层堆叠和立体互联实现了芯片和 …
[PDF][PDF] Review on the through Silicon Via Technology in the 3D-system in Package (3D-SiP)
王美玉, 张浩波, 胡伟波, 梅云辉 - Journal of Mechanical Engineering - qikan.cmes.org
With the increasing complexity of the system, the traditional packaging technology can no
longer meet the high-performance interconnection of multi-chips and multi-devices. 3D …
longer meet the high-performance interconnection of multi-chips and multi-devices. 3D …