Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …
suitable for depositing uniform and conformal films on complex three-dimensional …
Development of hafnium based high-k materials—A review
The move to implement metal oxide based gate dielectrics in a metal-oxide-semiconductor
field effect transistor is considered one of the most dramatic advances in materials science …
field effect transistor is considered one of the most dramatic advances in materials science …
Transparent heat regulating (THR) materials and coatings for energy saving window applications: Impact of materials design, micro-structural, and interface quality on …
This review highlights the development of energy saving transparent heat regulating (THR)
materials and coating for energy saving window applications. Current state-of-the-art …
materials and coating for energy saving window applications. Current state-of-the-art …
Growth, dielectric properties, and memory device applications of ZrO2 thin films
In the advancement of complementary metal-oxide-semiconductor device technology, SiO2
was used as an outstanding dielectric and has dominated the microelectronics industry for …
was used as an outstanding dielectric and has dominated the microelectronics industry for …
Atomic-scale simulation of ALD chemistry
Published papers on atomic-scale simulation of the atomic layer deposition (ALD) process
are reviewed. The main topic is reaction mechanism, considering the elementary steps of …
are reviewed. The main topic is reaction mechanism, considering the elementary steps of …
Atomic Layer Deposition of High‐k Oxides of the Group 4 Metals for Memory Applications
This paper reviews several high‐k ALD processes potentially applicable to the production of
capacitors, concentrating on very recent developments. A list of the dielectric materials …
capacitors, concentrating on very recent developments. A list of the dielectric materials …
Achieving high-performance silicon anodes of lithium-ion batteries via atomic and molecular layer deposited surface coatings: an overview
Rechargeable secondary batteries (RSBs) have been practiced successfully for over one
hundred years and now lithium-ion batteries (LIBs) represent the best-commercialized …
hundred years and now lithium-ion batteries (LIBs) represent the best-commercialized …
Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si (001)-(2× 1) surface
In this work, the authors used density-functional theory methods and x-ray photoelectron
spectroscopy to study the chemical composition and growth rate of HfO 2, Al 2 O 3, and TiO …
spectroscopy to study the chemical composition and growth rate of HfO 2, Al 2 O 3, and TiO …
Atomic layer deposition of groups 4 and 5 transition metal oxide thin films: focus on heteroleptic precursors
The atomic layer deposition (ALD) process, an alternative to CVD, is universally appreciated
for its unique advantages such as excellent repeatability, conformity, and thickness control at …
for its unique advantages such as excellent repeatability, conformity, and thickness control at …
Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water
The need for the conformal deposition of TiO2 thin films in device fabrication has motivated a
search for thermally robust titania precursors with noncorrosive byproducts. Alkylamido …
search for thermally robust titania precursors with noncorrosive byproducts. Alkylamido …