Recent advances in copper-doped titanium implants
Y Wu, H Zhou, Y Zeng, H ** coatings with cell stimulatory behaviour and …
Surface Stoichiometry and Optical Properties of Cux–TiyCz Thin Films Deposited by Magnetron Sputtering
Ternary carbide in metal matrix composites constitute a big challenge in the industry, and in
this regard their surface treatment is one of the most important issues. Ternary carbide (Cu x …
this regard their surface treatment is one of the most important issues. Ternary carbide (Cu x …
Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge
R Hippler, M Cada, Z Hubicka - Applied Physics Letters, 2020 - pubs.aip.org
High power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in argon gas was
investigated by time-resolved electrical (Langmuir) probe diagnostics and by time-integrated …
investigated by time-resolved electrical (Langmuir) probe diagnostics and by time-integrated …
Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
Reactive high power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in pure
argon gas and with different oxygen admixtures was investigated by time-resolved optical …
argon gas and with different oxygen admixtures was investigated by time-resolved optical …
Time-resolved diagnostics of a bipolar HiPIMS discharge
R Hippler, M Cada, Z Hubicka - Journal of Applied Physics, 2020 - pubs.aip.org
Bipolar high power impulse magnetron sputtering (HiPIMS) with a yttrium target is
investigated with the help of time-resolved diagnostics. The bipolar HiPIMS discharge is …
investigated with the help of time-resolved diagnostics. The bipolar HiPIMS discharge is …
Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
R Hippler, M Cada, P Ksirova, J Olejnicek… - Surface and Coatings …, 2021 - Elsevier
Cobalt oxide films were deposited with the help of reactive high power impulse magnetron
sputtering (HiPIMS) and mid-frequency pulsed magnetron sputtering (PMS) in argon gas at …
sputtering (HiPIMS) and mid-frequency pulsed magnetron sputtering (PMS) in argon gas at …
[HTML][HTML] Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates
A Hrubantova, R Hippler, H Wulff, M Cada… - Journal of Vacuum …, 2022 - pubs.aip.org
Tungsten oxide films are deposited with the help of reactive magnetron sputtering in an
argon/oxygen gas mixture. Films are deposited on different substrates, in particular, on soda …
argon/oxygen gas mixture. Films are deposited on different substrates, in particular, on soda …
[HTML][HTML] Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
Generation of singly charged Ar+ and Ti+, doubly charged Ar 2+ and Ti 2+, and of Ar 2+
and Ti 2+ dimer ions in a high power impulse magnetron sputtering (HiPIMS) discharge with …
and Ti 2+ dimer ions in a high power impulse magnetron sputtering (HiPIMS) discharge with …