Non-integral model-based scatterometry for CD metrology of single high-aspect-ratio microstructures

WH Chein, FS Yang, ZY Fu… - … Topography: Metrology and …, 2023 - iopscience.iop.org
This article presents an innovative model-based scatterometry method for CD metrology of
single high-aspect-ratio (HAR) microstructures, which are increasingly utilized in advanced …

Precise wide-range three-dimensional shape measurement method to measure superfine structures based on speckle interferometry

Y Arai - Optical Engineering, 2020 - spiedigitallibrary.org
With regard to the three-dimensional (3D) shape measurement, based on speckle
interferometry, of an object with a fine structure beyond the diffraction limit of the objective …

Far-field sectioning for the retrieval of subwavelength grating parameters using coherent Fourier scatterometry

L Siaudinyte, SF Pereira - Measurement Science and …, 2020 - iopscience.iop.org
Optical inspection of periodic nanostructures is a major challenge in the semiconductor
industry due to constantly decreasing critical dimensions. In this paper we combine coherent …

Phase retrieval applied to coherent Fourier scatterometry using the extended ptychographic iterative engine

P Dwivedi, JEH Cardoso Sakamoto, SF Pereira - OSA Continuum, 2019 - opg.optica.org
We have demonstrated that the extended ptychographic iterative engine (ePIE) algorithm
can be applied to retrieve the phase information of the vectorial scattered field of a …

Refinement strategies for optimal inclusion of prior information in ptychography

P Ansuinelli, WMJM Coene… - Extreme Ultraviolet …, 2020 - spiedigitallibrary.org
The imaging and inspection of extreme ultraviolet (EUV) masks is an important aspect of
EUV lithography. The availability of actinic mask inspection tools able to generate highly …