Thin metal film on porous carbon as a medium for electrochemical energy storage
Processing of suitable materials as sustainable, eco-friendly, and cheaper energy storing
electrodes offer significant challenges to overcome the current thresholds. In this work, we …
electrodes offer significant challenges to overcome the current thresholds. In this work, we …
Cobalt metal ALD: Understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity Co thin films
In this work, we report a new and promising approach toward the atomic layer deposition
(ALD) of metallic Co thin films. Utilizing the simple and known CoCl2 (TMEDA)(TMEDA= N …
(ALD) of metallic Co thin films. Utilizing the simple and known CoCl2 (TMEDA)(TMEDA= N …
Surface zeta potential of ALD-grown metal-oxide films
Z ** on the physical properties of Co3O4 thin films: experimental study and numerical simulation based on the AZO/ZnS/Co3O4:Zn …
Thin films of pure and zinc-doped nanostructures have been successfully grown using the
spray pyrolysis technique. Different characterization techniques were used to study the …
spray pyrolysis technique. Different characterization techniques were used to study the …
Area-selective atomic layer deposition of cobalt oxide to generate patterned cobalt films
The authors report the area-selective deposition of cobalt (II) oxide on polystyrene-patterned
SiO 2/Si and MgO (001) substrates at 180 C by atomic layer deposition (ALD) using bis (N …
SiO 2/Si and MgO (001) substrates at 180 C by atomic layer deposition (ALD) using bis (N …
[HTML][HTML] Atomic layer deposition of magnetic thin films: Basic processes, engineering efforts, and road forward
Atomic layer deposition (ALD) is known as a key enabler of the continuous advances in
device engineering for microelectronics. For instance, the state-of-the-art transistor …
device engineering for microelectronics. For instance, the state-of-the-art transistor …
Low temperature, area-selective atomic layer deposition of NiO and Ni
Nickel and nickel oxide are utilized within various device heterostructures for chemical
sensing, solar cells, batteries, etc. Recently, the rising interest in realizing low-cost, flexible …
sensing, solar cells, batteries, etc. Recently, the rising interest in realizing low-cost, flexible …
Plasma-enhanced atomic layer deposition of cobalt and cobalt nitride: what controls the incorporation of nitrogen?
The present study covers the processes that govern the incorporation of nitrogen in the film
during atomic layer deposition (ALD) of cobalt and cobalt nitride prepared from cobaltocene …
during atomic layer deposition (ALD) of cobalt and cobalt nitride prepared from cobaltocene …
Vacuum ultraviolet-enhanced oxidation—A route to the atomic layer etching of palladium metal
Low-temperature, plasma-free atomic layer etching (ALE) of Pd0 is explored. A vacuum
ultraviolet (VUV) light source (115< λ< 400 nm) is used in conjunction with a controlled O2 …
ultraviolet (VUV) light source (115< λ< 400 nm) is used in conjunction with a controlled O2 …