Advances in modeling and control will be required to meet future technical challenges in
microelectronics manufacturing. The implementation of closed-loop control on key unit …

Responding to the demand by researchers and practitioners for a comprehensive reference,
Handbook of Industrial and Systems Engineering offers full and easy access to a wide range …

Deep drawing is a metalworking procedure aimed at getting a cold metal sheet plastically
deformed in accordance with a pre-defined mould. Although this procedure is well …

Past experiments have demonstrated that details of the external electrical circuitry can
strongly influence the performance of radio frequency (rf) plasma processing reactors …

Semiconductor wafer etching is, to a large extent, an open-loop process with little direct
feedback control. Most silicon chip manufacturers rely on the rigorous adherence to a …

The design of decentralized proportional integral (PI) controller based on biggest log
modulus tuning (BLT) tuning method is extended to design centralized PI controllers for two …

Reactive Ion Etching (RIE) is a common process step in semiconductor manufacturing, yet
the underlying mechanisms remain poorly understood. Our goal is to reduce the variance of …

Metal sputter deposition processes for semiconductor manufacturing are characterized by a
decrease in deposition rate from run to run as the sputter target degrades. The goal is to …

Concerns optical measurement techniques for semiconductor manufacturing process
monitoring and control. They can provide previously impossible real-time monitoring of …

Plasma processes can present dicult control challenges due to time-varying dynamics and a
lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of …