Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas
A Dolgov, D Lopaev, T Rachimova… - Journal of Physics D …, 2014 - iopscience.iop.org
Cleaning of contamination of optical surfaces by amorphous carbon (aC) is highly relevant
for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for aC removal …
for extreme ultraviolet (EUV) lithography. We have studied the mechanisms for aC removal …
EUV lithography: Historical perspective and road ahead
VY Banine - 2014 - research.tue.nl
Lithography, in the form of carved type printing, can be dated as far back as the 3rd century
AD. Starting from the 19th century it played a major role as the basis for dissemination and …
AD. Starting from the 19th century it played a major role as the basis for dissemination and …