A mirror, in particular for a microlithographic projection exposure apparatus has an optically
effective surface (11), a mirror substrate (12), a reflection layer stack (21) for reflecting …

Abstract Mirror elements (2 a, 2 b) include a substrate (4 a, 4 b) and a multilayer
arrangement (5 a, 5 b). The multilayer arrangement includes a reflective layer system (6 a, 6 …

A method for producing an optical element includes: providing a substrate (102), applying a
layer system (103), wherein an optically effective surface (101) is formed and wherein the …

Abstract A mirror (10, 20, 30, 40), more particularly for a microlithographic projection
exposure apparatus, has an optical effective surface (10a, 20a, 30a, 40a), a mirror substrate …

An optical element includes: a base; a multilayer film which is provided on the base and in
which a plurality of unit laminate structures are laminated, each laminate structure having a …

The disclosure provides a method and an apparatus for modifying imaging properties of a
microlithographic optical system. In a method according to the disclosure, the imaging …

[0001] This is a Continuation of International Application PCT/EP2021/065326, which has an
international filing date of Jun. 8, 2021, and which claims the priority of German Patent …

A microlithographic projection exposure mirror has a mirror substrate (12, 32), a reflection
layer system (21, 41) for reflecting electromagnetic radiation that is incident on the mirror's …

A mirror for a microlithographic projection exposure apparatus, and a method for operating a
deformable mirror. In one aspect, a mirror includes an optical effective surface (11), a mirror …

A mirror that has a mirror substrate (12), a reflection layer stack (21) reflecting
electromagnetic radiation incident on the optical effective surface (11), and at least one …