[HTML][HTML] The influence of hydrogen on the chemical, mechanical, optical/electronic, and electrical transport properties of amorphous hydrogenated boron carbide

BJ Nordell, S Karki, TD Nguyen, P Rulis… - Journal of Applied …, 2015 - pubs.aip.org
Because of its high electrical resistivity, low dielectric constant (κ), high thermal neutron
capture cross section, and robust chemical, thermal, and mechanical properties, amorphous …

Evolution of a-Si: H to nc-Si: H transition of hydrogenated silicon films deposited by trichlorosilane using principle component analysis of optical emission …

SH Wang, HE Chang, CC Lee, YK Fuh, TT Li - Materials Chemistry and …, 2020 - Elsevier
Abstract Plasma Enhanced Chemical Vapor Deposition (PECVD) has been used for direct
production of wafer-equivalent quality silicon thin film solar cells, includes the nc-Si: H …

Optimal H2-dilution playing key role in accomplishing significant nanocrystallinity with both Si and Ge moieties in SiGe nanocomposite thin film network

A Dey, D Das - Applied Surface Science, 2022 - Elsevier
Accomplishing significant nanocrystallinity in SiGe alloy network during low-temperature
growth in RF-PECVD is a challenging task because it involves grossly different …

In situ plasma monitoring of PECVD nc-Si: H films and the influence of dilution ratio on structural evolution

YL Hsieh, LH Kau, HJ Huang, CC Lee, YK Fuh, TT Li - Coatings, 2018 - mdpi.com
We report plasma-enhanced chemical vapor deposition (PECVD) hydrogenated nano-
crystalline silicon (nc-Si: H) thin films. In particular, the effect of hydrogen dilution ratio (R …

Si-rich a-Si1− xCx thin films by dc magnetron co-sputtering of silicon and silicon carbide: Structural and optical properties

MA Ouadfel, A Keffous, A Brighet, N Gabouze… - Applied surface …, 2013 - Elsevier
Si-rich hydrogenated amorphous silicon carbide (a-Si1− xCx: H) thin films with different
carbon fractions were elaborated by a dc magnetron sputtering system. Their structural and …

Low-temperature growth of amorphous silicon films and direct fabrication of solar cells on flexible polyimide and photo-paper substrates

R Madaka, V Kanneboina, P Agarwal - Journal of Electronic Materials, 2018 - Springer
Direct deposition of hydrogenated amorphous silicon (a-Si: H) thin films and fabrication of
solar cells on polyimide (PI) and photo-paper (PP) substrates using a rf-plasma-enhanced …

Structural and optical properties of nc-Si: H thin films deposited by layer-by-layer technique

BT Goh, CK Wah, Z Aspanut, SA Rahman - Journal of Materials Science …, 2014 - Springer
Hydrogenated nanocrystalline silicon (nc-Si: H) thin films deposited on c-Si and quartz
substrates by layer-by-layer (LBL) technique using radio-frequency plasma enhanced …

Study on nanocrystalline silicon thin films grown by the filtered cathodic vacuum arc technique using boron doped solid silicon for fast photo detectors

RK Tripathi, OS Panwar, I Rawal, BP Singh… - Journal of the Taiwan …, 2018 - Elsevier
This paper reports the synthesis and properties of as grown and hydrogenated
nanocrystalline silicon (nc-Si or nc-Si: H) thin films deposited by the filtered cathodic vacuum …

Aerosol assisted atmospheric pressure chemical vapor deposition of silicon thin films using liquid cyclic hydrosilanes

S Guruvenket, JM Hoey, KJ Anderson, MT Frohlich… - Thin Solid Films, 2015 - Elsevier
Silicon (Si) thin films were produced using an aerosol assisted atmospheric pressure
chemical vapor deposition technique with liquid hydrosilane precursors cyclopentasilane …

Development of a novel fluorinated n-nc-SiO: H material for solar cell application

S Mandal, G Das, S Dhar, RM Tomy… - Materials Chemistry and …, 2015 - Elsevier
In this paper we report the development of fluorinated nanocrystalline SiO: F: H materials
prepared by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, the …