Enabling future nanomanufacturing through block copolymer self-assembly: A review

C Cummins, R Lundy, JJ Walsh, V Ponsinet, G Fleury… - Nano Today, 2020 - Elsevier
Self-assembly approaches, eg colloidal, emulsion and polymer phase separation, provide
scientists with an exotic yet direct platform to access technologically desired nanostructures …

Semiconductor nanowires: to grow or not to grow?

PC McIntyre, AF i Morral - Materials Today Nano, 2020 - Elsevier
Semiconductor nanowires have demonstrated exciting properties for nanophotonics,
sensors, energy technologies, and end-of-roadmap and beyond-roadmap electronic …

[PDF][PDF] Robust superhydrophobicity in large‐area nanostructured surfaces defined by block‐copolymer self assembly

A Checco, A Rahman, CT Black - Advanced Materials, 2014 - bnl.gov
Many natural surfaces such as plant leaves,[1] insects,[2] and animal bodies [3] are
superhydrophobic (SH), with a water contact angle in excess of 150 and contact-angle …

Three‐dimensional nanofabrication by block copolymer self‐assembly

CA Ross, KK Berggren, JY Cheng, YS Jung… - Advanced …, 2014 - Wiley Online Library
Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of
semiconductor devices, membranes, and other structures, taking advantage of microphase …

Nanomaterial processing using self-assembly-bottom-up chemical and biological approaches

R Thiruvengadathan, V Korampally… - Reports on Progress …, 2013 - iopscience.iop.org
Nanotechnology is touted as the next logical sequence in technological evolution. This has
led to a substantial surge in research activities pertaining to the development and …

Directed self-assembly of block copolymers for nanocircuitry fabrication

MA Morris - Microelectronic Engineering, 2015 - Elsevier
This paper is a perspective on progress that has been made in the use of block copolymers
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …

Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process

D Borah, MT Shaw, JD Holmes… - ACS Applied Materials & …, 2013 - ACS Publications
Block copolymer (BCP) microphase separation at surfaces might enable the generation of
substrate features in a scalable, manufacturable, bottom-up fashion provided that pattern …

Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer

C Cummins, A Gangnaik, RA Kelly, D Borah… - Nanoscale, 2015 - pubs.rsc.org
'Directing'block copolymer (BCP) patterns is a possible option for future semiconductor
device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently …

Directed Self‐Assembly of Poly(2‐vinylpyridine)‐b‐polystyrene‐b‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a …

Z Sun, Z Chen, W Zhang, J Choi, C Huang… - Advanced …, 2015 - Wiley Online Library
DOI: 10.1002/adma. 201501585 of the solvent. Morris and co-workers reported the use of a
mixed solvent vapor annealing of PS-b-P4VP at elevated temperatures to orient lamellar …

Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique

D Borah, R Senthamaraikannan, S Rasappa… - Acs Nano, 2013 - ACS Publications
Microphase separation of block copolymer (BCPs) thin films has high potential as a surface
patterning technique. However, the process times (during thermal or solvent anneal) can be …