Enabling future nanomanufacturing through block copolymer self-assembly: A review
Self-assembly approaches, eg colloidal, emulsion and polymer phase separation, provide
scientists with an exotic yet direct platform to access technologically desired nanostructures …
scientists with an exotic yet direct platform to access technologically desired nanostructures …
Semiconductor nanowires: to grow or not to grow?
Semiconductor nanowires have demonstrated exciting properties for nanophotonics,
sensors, energy technologies, and end-of-roadmap and beyond-roadmap electronic …
sensors, energy technologies, and end-of-roadmap and beyond-roadmap electronic …
[PDF][PDF] Robust superhydrophobicity in large‐area nanostructured surfaces defined by block‐copolymer self assembly
Many natural surfaces such as plant leaves,[1] insects,[2] and animal bodies [3] are
superhydrophobic (SH), with a water contact angle in excess of 150 and contact-angle …
superhydrophobic (SH), with a water contact angle in excess of 150 and contact-angle …
Three‐dimensional nanofabrication by block copolymer self‐assembly
Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of
semiconductor devices, membranes, and other structures, taking advantage of microphase …
semiconductor devices, membranes, and other structures, taking advantage of microphase …
Nanomaterial processing using self-assembly-bottom-up chemical and biological approaches
R Thiruvengadathan, V Korampally… - Reports on Progress …, 2013 - iopscience.iop.org
Nanotechnology is touted as the next logical sequence in technological evolution. This has
led to a substantial surge in research activities pertaining to the development and …
led to a substantial surge in research activities pertaining to the development and …
Directed self-assembly of block copolymers for nanocircuitry fabrication
MA Morris - Microelectronic Engineering, 2015 - Elsevier
This paper is a perspective on progress that has been made in the use of block copolymers
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …
Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process
Block copolymer (BCP) microphase separation at surfaces might enable the generation of
substrate features in a scalable, manufacturable, bottom-up fashion provided that pattern …
substrate features in a scalable, manufacturable, bottom-up fashion provided that pattern …
Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer
'Directing'block copolymer (BCP) patterns is a possible option for future semiconductor
device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently …
device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently …
Directed Self‐Assembly of Poly(2‐vinylpyridine)‐b‐polystyrene‐b‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a …
DOI: 10.1002/adma. 201501585 of the solvent. Morris and co-workers reported the use of a
mixed solvent vapor annealing of PS-b-P4VP at elevated temperatures to orient lamellar …
mixed solvent vapor annealing of PS-b-P4VP at elevated temperatures to orient lamellar …
Swift Nanopattern Formation of PS-b-PMMA and PS-b-PDMS Block Copolymer Films Using a Microwave Assisted Technique
Microphase separation of block copolymer (BCPs) thin films has high potential as a surface
patterning technique. However, the process times (during thermal or solvent anneal) can be …
patterning technique. However, the process times (during thermal or solvent anneal) can be …