Low dielectric constant materials

W Volksen, RD Miller, G Dubois - Chemical reviews, 2010 - ACS Publications
Modern computer microprocessor chips are marvels of engineering complexity. For the
current 45 nm technology node, there may be nearly a billion transistors on a chip barely 1 …

Characterization of amorphous and nanocrystalline carbon films

PK Chu, L Li - Materials chemistry and physics, 2006 - Elsevier
Amorphous and nanocrystalline carbon films possess special chemical and physical
properties such as high chemical inertness, diamond-like properties, and favorable …

High‐performance piezoelectric two‐dimensional covalent organic frameworks

Q Gu, X Lu, C Chen, X Wang, F Kang… - Angewandte Chemie …, 2024 - Wiley Online Library
Organic piezoelectric nanogenerators (PENGs) are attractive in harvesting mechanical
energy for various self‐powering systems. However, their practical applications are severely …

Near-and extended-edge x-ray-absorption fine-structure spectroscopy using ultrafast coherent high-order harmonic supercontinua

D Popmintchev, BR Galloway, MC Chen, F Dollar… - Physical Review Letters, 2018 - APS
Recent advances in high-order harmonic generation have made it possible to use a tabletop-
scale setup to produce spatially and temporally coherent beams of light with bandwidth …

Ultralow‐Dielectric‐Constant Atomic Layers of Amorphous Carbon Nitride Topologically Derived from MXene

H Wang, Z Du, Z Cheng, Z Cao, Y Ye… - Advanced …, 2023 - Wiley Online Library
Low‐dielectric‐constant materials such as silicon dioxide serving as interconnect insulators
in current integrated circuit face a great challenge due to their relatively high dielectric …

Electronic structure of carbon nitride thin films studied by X-ray spectroscopy techniques

N Hellgren, J Guo, Y Luo, C Såthe, A Agui… - Thin Solid Films, 2005 - Elsevier
Magnetron-sputtered carbon nitride thin films with different structures and compositions were
analyzed by X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS), near-edge X …

Fluorine-functionalized mesoporous alumina materials with superhydrophobic surfaces

J Shao, K Fu, Y Liu, S Xu, Z Sun, M Cao, Y Liu… - Surfaces and …, 2023 - Elsevier
Mesoporous alumina has been widely used in catalysis, adsorption, and drug delivery, in
which the specific application of mesoporous alumina depends on the functionalization of its …

Intrinsic low dielectric behaviour of a highly thermally stable Sr-based metal–organic framework for interlayer dielectric materials

M Usman, CH Lee, DS Hung, SF Lee… - Journal of Materials …, 2014 - pubs.rsc.org
A Sr-based metal–organic framework {[Sr2 (1, 3-bdc) 2 (H2O) 2]· H2O} n (1) was
synthesized under hydrothermal conditions by the reaction of Sr (NO3) 2 and 1, 3-bis (4, 5 …

Inductively coupled plasma etching of SiC in and etch-induced surface chemical bonding modifications

L Jiang, R Cheung, R Brown, A Mount - Journal of applied physics, 2003 - pubs.aip.org
4H silicon carbide (SiC) substrates were dry etched in an inductively coupled plasma (ICP)
system, using SF 6/O 2 gas mixtures. Etch rate and etch mechanisms have been …

Tuning the plasma etching mode for the atomic-scale smoothing of single-crystal silicon

B Wu, Y Zhang, R Yi, H Deng - The Journal of Physical Chemistry …, 2022 - ACS Publications
Atomic-scale smooth surfaces of single-crystal silicon (Si) are indispensable for cutting-edge
applications, such as semiconductor chips, quantum devices, and X-ray optics. Here, we …