A growing need exists for efficient and accurate methods for detecting defects in
semiconductor materials and devices. These defects can have a detrimental impact on the …

As the physical design of semiconductors continues to shrink, the lithography process is
becoming more sensitive to layout design. Identifying lithography hotspots (HSs) in the …

In this review, automatic defect inspection algorithms that analyze Electron Microscope (EM)
images of Semiconductor Manufacturing (SM) products are identified, categorized, and …

Background: Deep learning is a very fast-growing field in the area of artificial intelligence
with remarkable results in recent years. Many works in the lithography and photomask field …

As Extreme Ultraviolet (EUV) lithography has matured, numerous imposing technical
challenges have been the focus of intense scrutiny, including the EUV radiation source …

With the increasing demand for enhanced thermal performance and energy efficiency,
microchannel heat sinks (MCHSs) have garnered significant attention as an effective …

In semiconductor manufacturing industry, automated systems are essential for efficient and
accurate identification of defects, prior to final product completion, to ensure quality and …

Unlike optical masks which are transmissive optical elements, use of extreme ultraviolet
(EUV) radiation requires a reflective mask structure-a multi-layer coating consisting of …

Extreme ultraviolet lithography (EUVL) patterned mask defect detection is a major issue that
must be addressed to realize EUVL-based device fabrication. We have designed projection …