Recent advances and challenges in indium gallium nitride (inxga1-xn) materials for solid state lighting
R Kour, S Arya, S Verma, A Singh… - ECS Journal of Solid …, 2019 - iopscience.iop.org
In recent times, the demand for electrical energy is increased to such an extent that the
scientific research has to be focused on the development of materials that fulfil the growing …
scientific research has to be focused on the development of materials that fulfil the growing …
Recent advances in the MOVPE growth of indium nitride
Since a few years, indium nitride promising properties for device applications have attracted
much attention worldwide. Huge efforts are dedicated to optimize indium nitride growth …
much attention worldwide. Huge efforts are dedicated to optimize indium nitride growth …
InN: A material with photovoltaic promise and challenges
The potential of InN as a photovoltaic material is described. For solar applications, several
key developments such as p-type do** and solid-state rectifying junctions have yet to be …
key developments such as p-type do** and solid-state rectifying junctions have yet to be …
2 Electron Bandstructure Parameters Igor Vurgaftman and Jerry R. Meyer
I Vurgaftman - Nitride semiconductor devices: Principles and …, 2007 - books.google.com
In response to the current intensive scientific and commercial interest in nitride
semiconductors, several recent works have reviewed their material and physical properties …
semiconductors, several recent works have reviewed their material and physical properties …
Epitaxial growth of InN thin films by plasma-enhanced atomic layer deposition
X Feng, H Peng, J Gong, W Wang, H Liu… - Journal of Applied …, 2018 - pubs.aip.org
In this study, we report on the growth of crystalline InN thin films by plasma-enhanced atomic
layer deposition (PE-ALD). By systematically investigating the growth parameters, we …
layer deposition (PE-ALD). By systematically investigating the growth parameters, we …
Growth of GaN on Ge (111) by molecular beam epitaxy
RR Lieten, S Degroote, K Cheng, M Leys… - Applied physics …, 2006 - pubs.aip.org
The epitaxial growth of GaN on Ge is reported. The authors found that direct growth of GaN
performs exceptionally well on Ge (111) with plasma assisted molecular beam epitaxy. A …
performs exceptionally well on Ge (111) with plasma assisted molecular beam epitaxy. A …
Characteristics of InGaN designed for photovoltaic applications
This work addresses the required properties and device structures for an InGaN solar cell.
Homojunction InGaN solar cells with a bandgap greater than 2.0 eV are specifically targeted …
Homojunction InGaN solar cells with a bandgap greater than 2.0 eV are specifically targeted …
Misoriented domains in (0001)-GaN/(111)-Ge grown by molecular beam epitaxy
Structural characterization has been performed on (0001)-GaN epilayers grown on (111)-Ge
substrates using plasma assisted molecular beam epitaxy. By combining high-resolution x …
substrates using plasma assisted molecular beam epitaxy. By combining high-resolution x …
Single crystalline In x Ga 1− x N layers on germanium by molecular beam epitaxy
InxGa1− xN (InGaN) alloys are predominantly grown by heteroepitaxy on foreign substrates.
Most often Al2O3, SiC and Si are used as substrates, however this complicates vertical …
Most often Al2O3, SiC and Si are used as substrates, however this complicates vertical …
GaInN/GaN p‐i‐n light‐emitting solar cells
Y Fujiyama, Y Kuwahara, M Iwaya… - … status solidi c, 2010 - Wiley Online Library
GaInN/GaN p‐i‐n double‐heterojunction structures were grown by metal‐organic vapor
phase epitaxy on c‐plane sapphire substrates, and light‐emitting solar cells with different …
phase epitaxy on c‐plane sapphire substrates, and light‐emitting solar cells with different …