Nanoimprint lithography: methods and material requirements

LJ Guo - Advanced materials, 2007 - Wiley Online Library
Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐
throughput patterning of polymer nanostructures at great precision and at low costs. Unlike …

Advances in top–down and bottom–up surface nanofabrication: Techniques, applications & future prospects

A Biswas, IS Bayer, AS Biris, T Wang, E Dervishi… - Advances in colloid and …, 2012 - Elsevier
This review highlights the most significant advances of the nanofabrication techniques
reported over the past decade with a particular focus on the approaches tailored towards the …

Recent progress in nanoimprint technology and its applications

LJ Guo - Journal of Physics D: Applied Physics, 2004 - iopscience.iop.org
Nanoimprint is an emerging lithographic technology that promises high-throughput
patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint …

Micro-and nanopatterning techniques for organic electronic and optoelectronic systems

E Menard, MA Meitl, Y Sun, JU Park, DJL Shir… - Chemical …, 2007 - ACS Publications
The first organic transistors on plastic substrates were reported in 1990, providing an early
hint of the possibilities offered by plastic electronics. These devices used vacuumevaporated …

[HTML][HTML] Nanofabrication through molding

Z Liu, N Liu, J Schroers - Progress in Materials Science, 2022 - Elsevier
Nanomolding usually refers to a top-down fabrication method by which a formable or
moldable material is shaped using a mold of nanoscale dimensions. Nanomolding is the …

Fabrication approaches for generating complex micro-and nanopatterns on polymeric surfaces

A Del Campo, E Arzt - Chemical reviews, 2008 - ACS Publications
Recent innovations in the area of micro-and nanofabrication have created a unique
opportunity for patterning surfaces with features with lateral dimensions spanning over the …

Recent progress in simple and cost‐effective top‐down lithography for≈ 10 nm scale nanopatterns: from edge lithography to secondary sputtering lithography

WB Jung, S Jang, SY Cho, HJ Jeon… - Advanced …, 2020 - Wiley Online Library
The development of a simple and cost‐effective method for fabricating≈ 10 nm scale
nanopatterns over large areas is an important issue, owing to the performance …

Nanoimprinted polymer solar cell

Y Yang, K Mielczarek, M Aryal, A Zakhidov, W Hu - ACS nano, 2012 - ACS Publications
Among the various organic photovoltaic devices, the conjugated polymer/fullerene approach
has drawn the most research interest. The performance of these types of solar cells is greatly …

[PDF][PDF] Orthogonal patterning of PEDOT: PSS for organic electronics using hydrofluoroether solvents

PG Taylor, JK Lee, AA Zakhidov… - Advanced …, 2009 - academia.edu
Organic electronics is an emerging technology opening new opportunities in the field of
large-area electronics.[1] It has received enormous attention as a technology platform that …

Modulus-and surface energy-tunable ultraviolet-curable polyurethane acrylate: properties and applications

SJ Choi, HN Kim, WG Bae, KY Suh - Journal of Materials Chemistry, 2011 - pubs.rsc.org
Since the introduction of ultraviolet (UV)-curable polyurethane acrylate (PUA) materials in
2004, our group has extensively used the material in various applications ranging from …