Learning control for motion coordination in wafer scanners: toward gain adaptation

F Song, Y Liu, D Shen, L Li, J Tan - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
Accurate pattern transfer in wafer scanners necessitates the wafer stage and the reticle
stage executing a coordinated motion with the synchronization error in terms of nanometers …

Advanced motion control for precision mechatronics: Control, identification, and learning of complex systems

T Oomen - IEEJ Journal of Industry Applications, 2018 - jstage.jst.go.jp
Manufacturing equipment and scientific instruments, including wafer scanners, printers,
microscopes, and medical imaging scanners, require accurate and fast motions. An increase …

Enhanced kalman-filtering iterative learning control with application to a wafer scanner

Y Liu, L Li, X Yang, J Tan - Information Sciences, 2020 - Elsevier
In this paper, an enhanced kalman-filtering iterative learning control (KF-ILC) algorithm is
developed and applied to a wafer stage as a feedforward compensator of motion control. A …

Beyond decentralized wafer/reticle stage control design: A double-Youla approach for enhancing synchronized motion

E Evers, M van de Wal, T Oomen - Control Engineering Practice, 2019 - Elsevier
Industrial wafer scanners often consists of multiple subsystems. Traditionally, these systems-
of-systems are divided into manageable subproblems at the expense of the overall …

Sliding-mode control combined with improved adaptive feedforward for wafer scanner

X Li, Y Wang - Mechanical Systems and Signal Processing, 2018 - Elsevier
In this paper, a sliding-mode control method combined with improved adaptive feedforward
is proposed for wafer scanner to improve the tracking performance of the closed-loop …

On characterization of a generic lithography machine in a multi-directional space

YM Al-Rawashdeh, M Al Janaideh… - Mechanism and Machine …, 2022 - Elsevier
In this paper, we present a dynamics modeling approach for lithographic machines. These
machines consist of N-open chains with multiple stages in each chain. A stage can suppress …

Design techniques for multivariable ILC: Application to an industrial flatbed printer

L Blanken, J Willems, S Koekebakker, T Oomen - IFAC-PapersOnLine, 2016 - Elsevier
Iterative Learning Control (ILC) can significantly improve performance of systems that
perform repeating tasks. Although in practice many systems are multivariable, frequency …

Self-tuning in master–slave synchronization of high-precision stage systems

MF Heertjes, B Temizer, M Schneiders - Control Engineering Practice, 2013 - Elsevier
For synchronization of high-precision stage systems, in particular the synchronization
between a wafer and a reticle stage system of a wafer scanner, a master–slave controller …

Data-based motion control of wafer scanners

MF Heertjes - IFAC-PapersOnLine, 2016 - Elsevier
This paper gives an exposition of examples of data-based control and optimization that
found their way to successful application in the motion systems of industrial wafer scanners …

Minimizing cross-talk in high-precision motion systems using data-based dynamic decoupling

M Heertjes, A Van Engelen - Control Engineering Practice, 2011 - Elsevier
To minimize cross-talk in high-precision motion systems, the possibilities of data-based
dynamic decoupling are studied. Atop a model-based and static decoupling, a multi-input …