Accurate pattern transfer in wafer scanners necessitates the wafer stage and the reticle
stage executing a coordinated motion with the synchronization error in terms of nanometers …

Manufacturing equipment and scientific instruments, including wafer scanners, printers,
microscopes, and medical imaging scanners, require accurate and fast motions. An increase …

Accurate pattern transfer, coupled with stringent requirements for throughput and quality in
lithography systems, necessitates the wafer scanner to execute an aggressive motion with …

In this paper, we present a dynamics modeling approach for lithographic machines. These
machines consist of N-open chains with multiple stages in each chain. A stage can suppress …

In this paper, an enhanced kalman-filtering iterative learning control (KF-ILC) algorithm is
developed and applied to a wafer stage as a feedforward compensator of motion control. A …

摘要对于步进扫描投影光刻机, 掩模台和工件台的同步伺服性能将直接影响整机技术指标.
掩模台和工件台是典型的六自由度超精密运动台, 在耦合动力学, 复杂内外部干扰条件下兼顾高 …

Industrial wafer scanners often consists of multiple subsystems. Traditionally, these systems-
of-systems are divided into manageable subproblems at the expense of the overall …

This paper gives an exposition of examples of data-based control and optimization that
found their way to successful application in the motion systems of industrial wafer scanners …

In this paper, a sliding-mode control method combined with improved adaptive feedforward
is proposed for wafer scanner to improve the tracking performance of the closed-loop …

To minimize cross-talk in high-precision motion systems, the possibilities of data-based
dynamic decoupling are studied. Atop a model-based and static decoupling, a multi-input …