GaN integration technology, an ideal candidate for high-temperature applications: A review

A Hassan, Y Savaria, M Sawan - IEEE Access, 2018 - ieeexplore.ieee.org
In many leading industrial applications such as aerospace, military, automotive, and deep-
well drilling, extreme temperature environment is the fundamental hindrance to the use of …

GaN high electron mobility transistors for sub-millimeter wave applications

DS Lee, Z Liu, T Palacios - Japanese Journal of Applied Physics, 2014 - iopscience.iop.org
This paper reviews different technologies recently developed to push the performance of
GaN-based high electron mobility transistors (HEMTs) into sub-mm wave frequencies. To …

Gallium nitride based high power heterojunction field effect transistors: Process development and present status at UCSB

S Keller, YF Wu, G Parish, N Ziang… - … on Electron Devices, 2001 - ieeexplore.ieee.org
The development of GaN based devices for microwave power electronics at the University of
California, Santa Barbara (UCSB), is reviewed. From 1995 to 2000, the power performance …

Correlation of contact resistance with microstructure for Au/Ni/Al/Ti/AlGaN/GaN ohmic contacts using transmission electron microscopy

AN Bright, PJ Thomas, M Weyland, DM Tricker… - Journal of Applied …, 2001 - pubs.aip.org
Ohmic contacts to AlGaN/GaN heterostructures which have low contact resistance and good
surface morphology are required for the development of commercial high power, high …

Two-dimensional electron gases in Ga-face and N-face AlGaN/GaN heterostructures grown by plasma-induced molecular beam epitaxy and metalorganic chemical …

R Dimitrov, M Murphy, J Smart, W Schaff… - Journal of Applied …, 2000 - pubs.aip.org
We report on the growth of nominally undoped GaN/Al x Ga 1− x N/GaN (x< 0.4) high
mobility heterostructures with N-face or Ga-face polarity on sapphire substrates by plasma …

Trap characterization by gate-drain conductance and capacitance dispersion studies of an AlGaN/GaN heterostructure field-effect transistor

EJ Miller, XZ Dang, HH Wieder, PM Asbeck… - Journal of applied …, 2000 - pubs.aip.org
Gate-drain capacitance and conductance measurements were performed on an Al 0.15 Ga
0.85 N/GaN heterostructure field-effect transistor to study the effects of trap states on …

Gate-first AlGaN/GaN HEMT technology for high-frequency applications

OI Saadat, JW Chung, EL Piner… - IEEE electron device …, 2009 - ieeexplore.ieee.org
This letter describes a gate-first AlGaN/GaN high-electron mobility transistor (HEMT) with a
W/high-k dielectric gate stack. In this new fabrication technology, the gate stack is deposited …

Low nonalloyed Ohmic contact resistance to nitride high electron mobility transistors using N-face growth

MH Wong, Y Pei, T Palacios, L Shen… - Applied Physics …, 2007 - pubs.aip.org
Nonalloyed Ohmic contacts on Ga-face n+-Ga N∕ Al Ga N∕ Ga N high electron mobility
transistor (HEMT) structures typically have significant contact resistance to the two …

V/Al/Pt/Au Ohmic contact to n-AlGaN/GaN heterostructures

KO Schweitz, PK Wang, SE Mohney… - Applied physics …, 2002 - pubs.aip.org
A study of V/Al/Pt/Au and Ti/Al/Pt/Au contacts to n-Al 0.3 Ga 0.7 N/GaN heterostructures is
presented. Vanadium was chosen as a potential replacement for Ti because V is expected …

Characterizations of recessed gate AlGaN/GaN HEMTs on sapphire

T Egawa, GY Zhao, H Ishikawa… - IEEE Transactions on …, 2001 - ieeexplore.ieee.org
A recessed gate high electron mobility transistor (HEMT) has been fabricated with
AlGaN/GaN heterostructure on a sapphire substrate using metalorganic chemical vapor …