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GaN integration technology, an ideal candidate for high-temperature applications: A review
In many leading industrial applications such as aerospace, military, automotive, and deep-
well drilling, extreme temperature environment is the fundamental hindrance to the use of …
well drilling, extreme temperature environment is the fundamental hindrance to the use of …
GaN high electron mobility transistors for sub-millimeter wave applications
This paper reviews different technologies recently developed to push the performance of
GaN-based high electron mobility transistors (HEMTs) into sub-mm wave frequencies. To …
GaN-based high electron mobility transistors (HEMTs) into sub-mm wave frequencies. To …
Gallium nitride based high power heterojunction field effect transistors: Process development and present status at UCSB
The development of GaN based devices for microwave power electronics at the University of
California, Santa Barbara (UCSB), is reviewed. From 1995 to 2000, the power performance …
California, Santa Barbara (UCSB), is reviewed. From 1995 to 2000, the power performance …
Correlation of contact resistance with microstructure for Au/Ni/Al/Ti/AlGaN/GaN ohmic contacts using transmission electron microscopy
AN Bright, PJ Thomas, M Weyland, DM Tricker… - Journal of Applied …, 2001 - pubs.aip.org
Ohmic contacts to AlGaN/GaN heterostructures which have low contact resistance and good
surface morphology are required for the development of commercial high power, high …
surface morphology are required for the development of commercial high power, high …
Two-dimensional electron gases in Ga-face and N-face AlGaN/GaN heterostructures grown by plasma-induced molecular beam epitaxy and metalorganic chemical …
R Dimitrov, M Murphy, J Smart, W Schaff… - Journal of Applied …, 2000 - pubs.aip.org
We report on the growth of nominally undoped GaN/Al x Ga 1− x N/GaN (x< 0.4) high
mobility heterostructures with N-face or Ga-face polarity on sapphire substrates by plasma …
mobility heterostructures with N-face or Ga-face polarity on sapphire substrates by plasma …
Trap characterization by gate-drain conductance and capacitance dispersion studies of an AlGaN/GaN heterostructure field-effect transistor
EJ Miller, XZ Dang, HH Wieder, PM Asbeck… - Journal of applied …, 2000 - pubs.aip.org
Gate-drain capacitance and conductance measurements were performed on an Al 0.15 Ga
0.85 N/GaN heterostructure field-effect transistor to study the effects of trap states on …
0.85 N/GaN heterostructure field-effect transistor to study the effects of trap states on …
Gate-first AlGaN/GaN HEMT technology for high-frequency applications
This letter describes a gate-first AlGaN/GaN high-electron mobility transistor (HEMT) with a
W/high-k dielectric gate stack. In this new fabrication technology, the gate stack is deposited …
W/high-k dielectric gate stack. In this new fabrication technology, the gate stack is deposited …
Low nonalloyed Ohmic contact resistance to nitride high electron mobility transistors using N-face growth
Nonalloyed Ohmic contacts on Ga-face n+-Ga N∕ Al Ga N∕ Ga N high electron mobility
transistor (HEMT) structures typically have significant contact resistance to the two …
transistor (HEMT) structures typically have significant contact resistance to the two …
V/Al/Pt/Au Ohmic contact to n-AlGaN/GaN heterostructures
A study of V/Al/Pt/Au and Ti/Al/Pt/Au contacts to n-Al 0.3 Ga 0.7 N/GaN heterostructures is
presented. Vanadium was chosen as a potential replacement for Ti because V is expected …
presented. Vanadium was chosen as a potential replacement for Ti because V is expected …
Characterizations of recessed gate AlGaN/GaN HEMTs on sapphire
T Egawa, GY Zhao, H Ishikawa… - IEEE Transactions on …, 2001 - ieeexplore.ieee.org
A recessed gate high electron mobility transistor (HEMT) has been fabricated with
AlGaN/GaN heterostructure on a sapphire substrate using metalorganic chemical vapor …
AlGaN/GaN heterostructure on a sapphire substrate using metalorganic chemical vapor …